Fluoride

Fluoride

SCHEMBL82520

F.[P]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL37280 1.00
Fluoride SCHEMBL176811 1.00
Fluoride SCHEMBL7908443 1.00
Fluoride SCHEMBL37279 1.00
Fluoride SCHEMBL2779223 1.00
Fluoride SCHEMBL82517 1.00
Bromide SCHEMBL3326847 0.82
Fluoride SCHEMBL453421 0.82
Hydrochloric Acid SCHEMBL1773729 0.82
Fluoride SCHEMBL1565740 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2242 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122051435-A In-situ solid-state battery and preparation method thereof 四川赛科动力科技有限公司 2026-05-15 CN claimed
US-20260042669-A1 PURIFYING PHOSPHORUS HALIDE COMPOUNDS ENTEGRIS INC (US) 2026-02-12 US claimed
US-20260026282-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING LOW-TEMPERATURE PLASMA ETCHING PROCESS SAMSUNG ELECTRONICS CO, LTD. (KR) 2026-01-22 US claimed
US-12528974-B2 Polishing slurry composition KCTECH CO., LTD. (KR) 2026-01-20 US claimed
US-20250279263-A1 ETCHING METHOD AND PLASMA PROCESSING APPARATUS TOKYO ELECTRON LIMITED (JP) 2025-09-04 US claimed
US-12400835-B2 Plasma processing method and plasma processing system TOKYO ELECTRON LIMITED (JP) 2025-08-26 US claimed
US-12368027-B2 Substrate processing method and substrate processing apparatus TOKYO ELECTRON LIMITED (JP) 2025-07-22 US claimed
CN-120202532-A Etching method and plasma processing apparatus 东京毅力科创株式会社 2025-06-24 CN claimed
CN-119998964-A Self-poisoning lithium secondary battery 辉能科技股份有限公司 2025-05-13 CN claimed
CN-114560774-B Synthesis method of 2-fluoro-3-nitrobenzoic acid 九洲药业(杭州)有限公司 2025-05-06 CN claimed
US-20030153194-A1 Plasma etching uniformity control BEIJING XIAOMI MOBILE SOFTWARE CO., LTD. (CN) 2003-08-14 US claimed
US-6087704-A Structure and method for manufacturing group III-V composite Schottky contacts enhanced by a sulphur fluoride/phosphorus fluoride layer NATIONAL SCIENCE COUNCIL (TW) 2000-07-11 US claimed
CN-1173463-A Method for prodn. of feed grade calcium hydrophosphate DUAN XINGQUAN (CN) 1998-02-18 CN claimed
EP-0368651-B1 Epitaxial growth process and growing apparatus FUJITSU LTD (JP) 1994-09-07 EP claimed
US-5284926-A Fluorine compound, chromium compound, silica support; polymerization catalyst PHILLIPS PETROLEUM COMPANY (US) 1994-02-08 US claimed
CN-1072948-A Lubricating oil composition MITSUI PETROCHEMICAL IND (JP) 1993-06-09 CN claimed
EP-0368651-A2 Epitaxial growth process and growing apparatus FUJITSU LIMITED (JP) 1990-05-16 EP claimed
CN-88100675-A ANTIOXIDANT AROMATIC FLUOROPHOSPHITES 1988-11-09 CN claimed
US-4495300-A FORMATION OF ZIRCON BY FIRING WITH COMPOUNDS OF ZIRCONIUM AND PHOSPHORUS; THERMAL SHOCK RESISTANCE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY, MINISTRY OF INTERNATIONAL TRADE AND INDUSTRY (JP) 1985-01-22 US claimed
US-4465885-A ALKYLATION, OLIGOMERIZATION UOP INC. (US) 1984-08-14 US claimed