⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8276155 | 0.88 | — | — | |
| SCHEMBL18043723 | 0.83 | — | — | |
| SCHEMBL18298080 | 0.83 | — | — | |
| SCHEMBL18298085 | 0.83 | — | — | |
| SCHEMBL8276150 | 0.83 | — | — | |
| SCHEMBL6661239 | 0.78 | KDM4E (0.34) | — | |
| SCHEMBL18889840 | 0.77 | ALDH1A1 (0.33) | — | |
| SCHEMBL8276152 | 0.76 | — | — | |
| SCHEMBL4932853 | 0.76 | KDM4E (0.31) | — | |
| SCHEMBL12573998 | 0.76 | KDM4E (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250044697-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM HAVING CARBONYL STRUCTURE | NISSAN CHEMICAL CORPORATION (JP) | 2025-02-06 | — | — | US | disclosed |
| CN-110809739-B | Composition for forming silicon-containing resist underlayer film soluble in alkaline developer | 日产化学株式会社 | 2023-11-21 | — | — | CN | disclosed |
| CN-115016230-A | Composition for forming silicon-containing resist underlayer film | 日产化学工业株式会社 | 2022-09-06 | — | — | CN | disclosed |
| US-20220155688-A1 | ALKALINE DEVELOPER SOLUABLE SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2022-05-19 | — | — | US | disclosed |
| US-11281104-B2 | Alkaline developer soluable silicon-containing resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2022-03-22 | — | — | US | disclosed |
| CN-107003613-B | Composition for forming resist underlayer film for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group | 日产化学工业株式会社 | 2021-06-15 | — | — | CN | disclosed |
| CN-112558410-A | Composition for forming silicon-containing resist underlayer film having organic group containing aliphatic polycyclic structure | 日产化学工业株式会社 | 2021-03-26 | — | — | CN | disclosed |
| CN-107209460-B | Composition for forming resist underlayer film for lithography containing hydrolyzable silane having carbonate skeleton | 日产化学工业株式会社 | 2020-12-18 | — | — | CN | disclosed |
| US-10838303-B2 | Resist underlayer film forming composition for lithography containing hydrolyzable silane having carbonate skeleton | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2020-11-17 | — | — | US | disclosed |
| US-20200225584-A1 | ALKALINE DEVELOPER SOLUABLE SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2020-07-16 | — | — | US | disclosed |
| US-20170293227-A1 | COATING LIQUID FOR RESIST PATTERN COATING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-10-12 | — | — | US | disclosed |
| US-20170293227-A1 | COATING LIQUID FOR RESIST PATTERN COATING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-10-12 | — | — | US | disclosed |
| US-20170293227-A1 | COATING LIQUID FOR RESIST PATTERN COATING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-10-12 | — | — | US | disclosed |
| US-20170153549-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING ORGANIC GROUP HAVING ALIPHATIC POLYCYCLIC STRUCTURE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-06-01 | — | — | US | disclosed |
| CN-106715619-A | Application solution for resist pattern coating | 日产化学工业株式会社 | 2017-05-24 | — | — | CN | disclosed |
| US-20160363867-A1 | POLYMER-CONTAINING COATING LIQUID APPLIED TO RESIST PATTERN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| US-20160363867-A1 | POLYMER-CONTAINING COATING LIQUID APPLIED TO RESIST PATTERN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| US-20160363867-A1 | POLYMER-CONTAINING COATING LIQUID APPLIED TO RESIST PATTERN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| CN-106030418-A | Polymer-containing coating liquid applied to resist pattern | 日产化学工业株式会社 | 2016-10-12 | — | — | CN | disclosed |
| US-20120129048-A1 | BINDER FOR LITHIUM SECONDARY BATTERY, NEGATIVE ELECTRODE FOR LITHIUM SECONDARY BATTERY, LITHIUM SECONDARY BATTERY, BINDER PRECURSOR SOLUTION FOR LITHIUM SECONDARY BATTERY, AND METHOD FOR MANUFACTURING NEGATIVE ELECTRODE FOR LITHIUM SECONDARY BATTERY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-24 | — | — | US | disclosed |