SCHEMBL828215

SCHEMBL828215

[CH2][CH]C[CH2]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14991021 0.64
SCHEMBL975733 0.64
SCHEMBL42640 0.64
SCHEMBL42641 0.64
SCHEMBL23908703 0.62
SCHEMBL1328 0.62
SCHEMBL11264582 0.62
SCHEMBL973906 0.62
SCHEMBL43592 0.62
SCHEMBL976266 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 366 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0624166-B1 POLYMERIZABLE CARBOHYDRATE ESTERS, POLYMERS MADE FROM SUCH ESTERS AND THE USE OF SUCH POLYMERS CIBA GEIGY AG (CH) 1997-04-16 EP claimed
US-5571882-A CONTACT LENSES CIBA-GEIBY CORPORATION (US) 1996-11-05 US claimed
EP-0624166-A1 POLYMERIZABLE CARBOHYDRATE ESTERS, POLYMERS MADE FROM SUCH ESTERS AND THE USE OF SUCH POLYMERS. CIBA GEIGY AG (CH) 1994-11-17 EP claimed
WO-1994012540-A1 POLYMERIZABLE CARBOHYDRATE ESTERS, POLYMERS MADE FROM SUCH ESTERS AND THE USE OF SUCH POLYMERS CIBA-GEIGY AG (CH) 1994-06-09 WO claimed
US-RE33489-E LIGHT STABILIZERS CIBA-GEIGY CORPORATION (US) 1990-12-11 US claimed
US-4952620-A STABILIZERS FOR ACID CURABLE RESINS CIBA-GEIGY CORPORATION (US) 1990-08-28 US claimed
US-4785102-A PHOTOSTABILIZERS FOR POLYMERS CIBA-GEIGY CORPORATION (US) 1988-11-15 US claimed
US-4089960-A Antiemetic, psychosomatic and antipsychotic heterocyclic pyridine carboxamides CIBA-GEIGY CORPORATION (US) 1978-05-16 US claimed
US-3990881-A HERBICIDES ELI LILLY AND COMPANY (US) 1976-11-09 US claimed
US-20240231230-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-07-11 US disclosed
US-20240201593-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2024-06-20 US disclosed
CN-117999296-A Composition and photosensitive composition 东京应化工业株式会社 2024-05-07 CN disclosed
CN-117980347-A Photosensitive composition 东京应化工业株式会社 2024-05-03 CN disclosed
CN-117980346-A Composition and photosensitive composition 东京应化工业株式会社 2024-05-03 CN disclosed
US-4267296-A Oxygen-curable mercapto-functional organosilicon-organic compound compositions possessing rapid surface reaction and method of forming higher molecular weight products therefrom DOW CORNING CORPORATION (US) 1981-05-12 US disclosed
US-4189321-A COUPLER CONTAINING AT LEAST FOUR 5-PYRAZOLONE RESIDUES KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1980-02-19 US disclosed
US-4178378-A ANTIEPILEPTIC AGENT, TRANQUILIZER, AND ANTICONVULSANT CIBA-GEIGY CORPORATION (US) 1979-12-11 US disclosed
US-4089960-A Antiemetic, psychosomatic and antipsychotic heterocyclic pyridine carboxamides CIBA-GEIGY CORPORATION (US) 1978-05-16 US disclosed
US-4089960-A Antiemetic, psychosomatic and antipsychotic heterocyclic pyridine carboxamides CIBA-GEIGY CORPORATION (US) 1978-05-16 US disclosed
US-3990881-A HERBICIDES ELI LILLY AND COMPANY (US) 1976-11-09 US disclosed