Thiosulfuric Acid

Thiosulfuric Acid

SCHEMBL828949

O=S(=O)(O)S.[Au].[NaH].[NaH].[NaH]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3186413-B1 COMPOSITION, USE THEREOF AND METHOD FOR ELECTRODEPOSITING GOLD CONTAINING LAYERS ATOTECH DEUTSCHLAND GMBH (DE) 2019-02-06 EP disclosed
EP-3023520-B1 ENVIRONMENTALLY FRIENDLY GOLD ELECTROPLATING COMPOSITIONS AND CORRESPONDING METHOD ROHM & HAAS ELECT MAT (US) 2019-01-30 EP disclosed
EP-1306466-B1 Electroless gold plating composition ROHM & HAAS ELECT MAT (US) 2018-11-21 EP disclosed
EP-2634293-B1 COMPOSITES OF CARBON BLACK AND METAL ROHM & HAAS ELECT MAT (US) 2018-07-18 EP disclosed
EP-3186413-A1 COMPOSITION, USE THEREOF AND METHOD FOR ELECTRODEPOSITING GOLD CONTAINING LAYERS ATOTECH Deutschland GmbH (DE) 2017-07-05 EP disclosed
US-20170159195-A1 COMPOSITION, USE THEREOF AND METHOD FOR ELECTRODEPOSITING GOLD CONTAINING LAYERS ATOTECH DEUTSCHLAND GMBH (DE) 2017-06-08 US disclosed
EP-1728898-B1 Electrolytes for the deposition of gold alloys ROHM & HAAS ELECT MAT (US) 2017-02-22 EP disclosed
US-20160145756-A1 ENVIRONMENTALLY FRIENDLY GOLD ELECTROPLATING COMPOSITIONS AND METHODS ROHM AND HAAS ELECRONIC MATERIALS LLC 2016-05-26 US disclosed
US-20160145745-A1 FORMALDEHYDE-FREE ELECTROLESS METAL PLATING COMPOSITIONS AND METHODS ROHM AND HAAS ELECRONIC MATERIALS LLC 2016-05-26 US disclosed
EP-3023515-A2 FORMALDEHYDE-FREE ELECTROLESS METAL PLATING COMPOSITIONS AND METHODS Rohm and Haas Electronic Materials LLC (US) 2016-05-25 EP disclosed
US-20090104463-A1 Gold alloy electrolytes ROHM AND HAAS ELECTRONIC MATERIALS LLC 2009-04-23 US disclosed
US-7465385-B2 Gold alloy electrolytes ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-12-16 US disclosed
US-20060283714-A1 Gold alloy electrolytes ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2006-12-21 US disclosed
EP-1728898-A2 Electrolytes for the deposition of gold alloys Rohm and Haas Electronic Materials LLC (US) 2006-12-06 EP disclosed
US-6911230-B2 Plating method SHIPLEY COMPANY, L.L.C. (US) 2005-06-28 US disclosed
US-6776828-B2 ELECTROLESS GOLD PLATING COMPOSITION COMPRISING ONE OR MORE WATER SOLUBLE GOLD COMPOUNDS, ONE OR MORE GOLD COMPLEXING AGENTS, ONE OR MORE ORGANIC STABILIZER COMPOUNDS, AND ONE OR MORE UNIFORMITY ENHANCERS SHIPLEY COMPANY, L.L.C. 2004-08-17 US disclosed
US-20040018308-A1 Plating method SHIPLEY COMPANY, L.L.C. 2004-01-29 US disclosed
US-20040009292-A1 Including one or more water soluble gold compounds, gold complexing agents, organic stabilizer compounds, and carboxylic acid uniformity enhancers; for printed wiring board substrates, integrated circuits, lead frames, pads SHIPLEY COMPANY, L.L.C. (US) 2004-01-15 US disclosed
EP-1319734-A1 Plating method Shipley Co. L.L.C. (US) 2003-06-18 EP disclosed
EP-1306466-A2 Electroless gold plating composition Shipley Co. L.L.C. (US) 2003-05-02 EP disclosed