SCHEMBL8304444

SCHEMBL8304444

C=C(C(=O)O)C(=O)CN

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL28829155 0.97 OR51E2 (0.40)
SCHEMBL27822323 0.77
SCHEMBL10282191 0.75
SCHEMBL10041238 0.74
SCHEMBL28240771 0.73
SCHEMBL21985974 0.72 KDM4E (0.37)
SCHEMBL6002134 0.71
SCHEMBL21048981 0.71 LDHA (0.44)
SCHEMBL6474897 0.69
SCHEMBL5473595 0.69 CA1 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108473838-A Adhesive composition 住友化学株式会社 2018-08-31 CN disclosed
CN-102893152-B The polymkeric substance of ligand functionalized 3M INNOVATIVE PROPERTIES CO. (US) 2015-12-16 CN disclosed
CN-102893152-A Ligand functionalized polymers 3M INNOVATIVE PROPERTIES CO 2013-01-23 CN disclosed
CN-100364649-C Aqueous emulsion polymer as dispersant EFKA ADDITIVES B V (NL) 2008-01-30 CN disclosed
CN-1284046-C Photosensitive resin composition, photosensitive element, resist pattern, method for producing resist pattern, and substrate having the resist pattern laminated thereon HITACHI CHEMICAL CO LTD (JP) 2006-11-08 CN disclosed
CN-1713955-A Aqueous emulsion polymers as dispersants EFKA ADDITIVES B V (NL) 2005-12-28 CN disclosed
US-5879378-A Exothermic device and an application pad using the same KABUSHIKI KAISHA GENCHI KENKYUSHO (JP) 1999-03-09 US disclosed
EP-0581250-B1 Process for biotechnical preparation of L-thienylalanines in enantiomere pure form from 2-hydroxy-3-thienyl-acrylic acids and their use HOECHST AG (DE) 1999-03-03 EP disclosed
US-5780640-A Process for the biotechnological preparation of L-thienylalanines in enantiomerically pure form from 2-hydroxy-3-thienylacrylic acids and their use HOECHST AKTIENGESELLSCHAFT (DE) 1998-07-14 US disclosed
US-5688672-A Process for the biotechnological preparation of L-thienylalanines in enantiomerically pure form from 2-hydroxy-3-thienylacrylic acids HOECHST AKTIENGESELLSCHAFT (DE) 1997-11-18 US disclosed
US-5480786-A Process for the biotechnological preparation of l-thienylalanines in enantiomerically pure form from 2-hydroxy-3-thienylacrylic acids, and their use HOECHST AKTIENGESELLSCHAFT (DE) 1996-01-02 US disclosed
EP-0581250-A2 Process for biotechnical preparation of L-thienylalanines in enantiomere pure form from 2-hydroxy-3-thienyl-acrylic acids and their use HOECHST AKTIENGESELLSCHAFT (DE) 1994-02-02 EP disclosed