Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 10/20 | 0.66 |
| ▸ | KDM1A | O60341 | 1/20 | 0.48 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | MAPKAPK2 | P49137 | 2/20 | 0.36 |
| ▸ | OGA | O60502 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | PKM | P14618 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9658092 | 0.93 | ELANE (0.58) | ELANEKDM1AMEN1KMT2ACA2 | |
| SCHEMBL8322043 | 0.93 | ELANE (0.58) | ELANEKDM1AMEN1KMT2ACA2 | |
| SCHEMBL795385 | 0.93 | ELANE (0.58) | ELANEKDM1AMEN1KMT2ACA2 | |
| SCHEMBL8319671 | 0.92 | ELANE (0.57) | ELANEKDM1AMEN1KMT2ACA2 | |
| SCHEMBL8323431 | 0.89 | ELANE (0.54) | ELANEKDM1AMEN1KMT2ACA2 | |
| SCHEMBL8322957 | 0.89 | ELANE (0.54) | ELANEKDM1AMEN1KMT2ACA2 | |
| SCHEMBL4061370 | 0.88 | ELANE (0.81) | ELANEKDM1AMEN1KMT2ACA2 | |
| SCHEMBL8387548 | 0.87 | ELANE (0.64) | ELANEKDM1AMEN1KMT2ACA2 | |
| SCHEMBL8323468 | 0.87 | ELANE (0.51) | ELANEKDM1ACA2POLBMAPT | |
| Trifluoromethanesulfonic Acid SCHEMBL8387211 | 0.87 | ELANE (0.51) | ELANEKDM1AMEN1KMT2ACA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0297443-B1 | Light sensitive mixture for light sensitive coating materials | BASF AG (DE) | 1994-06-08 | — | — | EP | claimed |
| US-5318876-A | Solutions of water insoluble, base soluble polymeric binder, substituted sulfonium salts, substituted benzenesulfonates, having tolerance for delay between exposure and heating to develop | BASF AKTIENGESELLSCHAFT (DE) | 1994-06-07 | — | — | US | claimed |
| EP-0342495-B1 | Light-sensitive composition and process for the formation of relief patterns | BASF AG (DE) | 1994-01-12 | — | — | EP | claimed |
| US-5073474-A | Organic compound containing acid cleavable group(s) which also forms strong acid on irradiation, positive-working | BASF AKTIENGESELLSCHAFT (DE) | 1991-12-17 | — | — | US | claimed |
| US-4883740-A | RELIEF PATTERNS AND IMAGES | BASF AKTIENGESELLSCHAFT (DE) | 1989-11-28 | — | — | US | claimed |
| US-8916333-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-12-23 | — | — | US | disclosed |
| US-8895222-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-11-25 | — | — | US | disclosed |
| US-8440384-B2 | Compound, salt, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2013-05-14 | — | — | US | disclosed |
| US-20130022926-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-01-24 | — | — | US | disclosed |
| US-8043786-B2 | Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions | JSR CORPORATION (JP) | 2011-10-25 | — | — | US | disclosed |
| US-8026039-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2011-09-27 | — | — | US | disclosed |
| US-7956142-B2 | Polymerizable sulfonic acid onium salt and resin | JSR CORPORATION (JP) | 2011-06-07 | — | — | US | disclosed |
| US-5204216-A | RADIATION-SENSITIVE MIXTURE | BASF AKTIENGESELLSCHAFT (DE) | 1993-04-20 | — | — | US | disclosed |
| US-5118585-A | POSITIVE AND NEGATIVE WORKING RADIATION SENSITIVE MIXTURES AND PRODUCTION OF RELIEF PATTERNS | BASF AKTIENGESELLSCHAFT (DE) | 1992-06-02 | — | — | US | disclosed |
| US-5075199-A | RADIATION SENSITIVE MIXTURE AND PRODUCTION OF RELIEF PATTERNS | BASF AKTIENGESELLSCHAFT (DE) | 1991-12-24 | — | — | US | disclosed |
| US-5073474-A | Organic compound containing acid cleavable group(s) which also forms strong acid on irradiation, positive-working | BASF AKTIENGESELLSCHAFT (DE) | 1991-12-17 | — | — | US | disclosed |
| US-5069998-A | RADIATION SENSITIVE MIXTURE AND PRODUCTION OF RELIEF PATTERNS | BASF AKTIENGESELLSCHAFT (DE) | 1991-12-03 | — | — | US | disclosed |
| US-5069997-A | POSITIVE AND NEGATIVE WORKING RADIATION SENSITIVE MIXTURES AND PRODUCTION OF RELIEF PATTERNS | KEIL & WEINKAUF (DE) | 1991-12-03 | — | — | US | disclosed |
| US-5064746-A | RADIATION-SENSITIVE MIXTURE FOR PHOTOSENSITIVE COATING MATERIALS AND THE PRODUCTION OF RELIEF PATTERNS AND RELIEF IMAGES | BASF AKTIENGESELLSCHAFT (DE) | 1991-11-12 | — | — | US | disclosed |
| US-4883740-A | RELIEF PATTERNS AND IMAGES | BASF AKTIENGESELLSCHAFT (DE) | 1989-11-28 | — | — | US | disclosed |