Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 9/20 | 0.58 |
| ▸ | KDM1A | O60341 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 3/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 3/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | ATM | Q13315 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8322043 | 1.00 | ELANE (0.58) | ELANEKDM1AMAPTL3MBTL1TDP1 | |
| SCHEMBL8323108 | 0.93 | ELANE (0.66) | ELANEKDM1AMAPTMEN1KMT2A | |
| SCHEMBL8323468 | 0.93 | ELANE (0.51) | ELANEKDM1AMAPTL3MBTL1TDP1 | |
| SCHEMBL10589902 | 0.90 | ELANE (0.49) | ELANEKDM1AMAPTL3MBTL1TDP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL7122594 | 0.88 | ELANE (0.47) | ELANEKDM1AMAPTL3MBTL1TDP1 | |
| SCHEMBL9658092 | 0.87 | ELANE (0.58) | ELANEKDM1AMAPTALDH1A1MEN1 | |
| SCHEMBL795409 | 0.87 | ELANE (0.46) | ELANEKDM1AL3MBTL1ALDH1A1CA2 | |
| SCHEMBL13131239 | 0.86 | ELANE (0.46) | ELANEKDM1AMAPTL3MBTL1TDP1 | |
| SCHEMBL8322200 | 0.86 | ELANE (0.46) | ELANEKDM1AMAPTL3MBTL1TDP1 | |
| SCHEMBL3695509 | 0.86 | ELANE (0.45) | ELANEKDM1AMAPTALDH1A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230133710-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20230133710-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20230038825-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR MANUFACTURING PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK | FUJIFILM CORPORATION (JP) | 2023-02-09 | — | — | US | disclosed |
| US-20220206386-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2022-06-30 | — | — | US | disclosed |
| US-20220127225-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-04-28 | — | — | US | disclosed |
| US-20210188770-A1 | ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-06-24 | — | — | US | disclosed |
| US-20210179554-A1 | ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-06-17 | — | — | US | disclosed |
| US-10824073-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2020-11-03 | — | — | US | disclosed |
| US-10809616-B2 | Cholate photoacid generators and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-10-20 | — | — | US | disclosed |
| US-20170285470-A1 | CHOLATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-10-05 | — | — | US | disclosed |
| US-7465528-B2 | Positive-working photosensitive composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2008-12-16 | — | — | US | disclosed |
| US-7341817-B2 | Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-03-11 | — | — | US | disclosed |
| US-20070087288-A1 | Positive-working photosensitive composition and pattern forming method using the same | FUJIFILM CORPORATION | 2007-04-19 | — | — | US | disclosed |
| US-20070054214-A1 | Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions | JSR CORPORATION (JP) | 2007-03-08 | — | — | US | disclosed |
| EP-1059314-B1 | A resist composition | WAKO PURE CHEM IND LTD (JP) | 2004-12-22 | — | — | EP | disclosed |
| US-6716573-B2 | Resist Composition | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2004-04-06 | — | — | US | disclosed |
| US-20030039920-A1 | Resist composition | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2003-02-27 | — | — | US | disclosed |
| US-6432608-B1 | FINENESS PATTERN | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2002-08-13 | — | — | US | disclosed |
| EP-1059314-A1 | A resist composition | Wako Pure Chemical Industries, Ltd. (JP) | 2000-12-13 | — | — | EP | disclosed |
| US-5880169-A | HAVING HIGH RESOLUTION FOR FINE PATTERNING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-03-09 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170285470-A1 | CHOLATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | GGCT, LCAT, SLC7A11 | ELANE 4143/4885KDM1A 3302/4885MAPT 465/4885 |
| US-10809616-B2 | Cholate photoacid generators and photoresists comprising same | GGCT, LCAT, SLC7A11 | ELANE 4143/4885KDM1A 3302/4885MAPT 465/4885 |
| US-20210179554-A1 | ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SLC6A5, LIFR, SLC6A9 | ELANE 2738/4885KDM1A 2489/4885MAPT 2273/4885 |
| US-20220127225-A1 | ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | CACNA1F, SLC6A5, IDUA | ELANE 3192/4885KDM1A 2109/4885MAPT 2279/4885 |
| US-20210188770-A1 | ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SLC6A5, LIFR, SLC6A9 | ELANE 2738/4885KDM1A 2489/4885MAPT 2273/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.