SCHEMBL832537

SCHEMBL832537

O=C(C=Cc1ccccc1)OCC(OC1=CCCC1)OC1=CCCC1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.47
AKR1B10 O60218 5/20 0.45
AKR1B1 P15121 5/20 0.45
ALDH1A1 P00352 1/20 0.44
CA12 O43570 1/20 0.41
CA4 P22748 1/20 0.41
CA6 P23280 1/20 0.41
CA5A P35218 1/20 0.41
CA7 P43166 1/20 0.41
CA9 Q16790 1/20 0.41
CA14 Q9ULX7 1/20 0.41
CA5B Q9Y2D0 1/20 0.41
RAB9A P51151 3/20 0.40
NPC1 O15118 1/20 0.40
HPGD P15428 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
MGLL Q99685 2/20 0.39
APP P05067 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL832536 1.00 LMNA (0.47) LMNAAKR1B10AKR1B1ALDH1A1CA12
SCHEMBL29130283 0.86 GSTP1 (0.41)
SCHEMBL29130285 0.83 GSTP1 (0.38)
SCHEMBL3440785 0.81 GSTP1 (0.53)
SCHEMBL3440787 0.81 GSTP1 (0.53)
SCHEMBL57576 0.78 TSHR (0.41) ALDH1A1HPGDSMN1; SMN2
Bromide SCHEMBL29698919 0.77 TSHR (0.40) ALDH1A1
SCHEMBL6826961 0.73 GSTP1 (0.33)
SCHEMBL15169672 0.72 LMNA (0.63) LMNAAKR1B10AKR1B1ALDH1A1CA12
SCHEMBL12083421 0.72 LMNA (0.63) LMNAAKR1B10AKR1B1ALDH1A1CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2007587-B1 INKJET RECORDING METHOD RICOH CO LTD (JP) 2013-07-24 EP disclosed
US-8399541-B2 Active energy ray-curable ink composition and printed matter DIC CORPORATION (JP) 2013-03-19 US disclosed
US-8142849-B2 Recording media, recording media-ink set, inkjet recording method and inkjet recording apparatus RICOH COMPANY, LTD. (JP) 2012-03-27 US disclosed
EP-2064067-B1 INK JET RECORDING METHOD RICOH CO LTD (JP) 2011-06-08 EP disclosed
US-7938527-B2 Ink, ink cartridge, ink jet recording apparatus, and ink jet recording method RICOH COMPANY, LTD. (JP) 2011-05-10 US disclosed
US-20110014438-A1 ACTIVE ENERGY RAY-CURABLE INK COMPOSITION AND PRINTED MATTER DIC CORPORATION (JP) 2011-01-20 US disclosed
EP-2258778-A1 ACTIVE ENERGY RAY-CURABLE INK COMPOSITION AND PRINTED MATTER DIC Corporation (JP) 2010-12-08 EP disclosed
US-20100265292-A1 INK, INK CARTRIDGE, INK JET RECORDING APPARATUS, AND INK JET RECORDING METHOD RICOH COMPANY, LTD. (JP) 2010-10-21 US disclosed
US-7649027-B2 having juts via photopolymerization in supercritical carbon dioxide; calcining KANSAI PAINT CO., LTD. (JP) 2010-01-19 US disclosed
US-20090291213-A1 RECORDING MEDIA, RECORDING MEDIA-INK SET, INKJET RECORDING METHOD AND INKJET RECORDING APPARATUS RICOH COMPANY, LTD. (JP) 2009-11-26 US disclosed
WO-2007049806-A1 RECORDING MEDIA, RECORDING MEDIA-INK SET, INKJET RECORDING METHOD AND INKJET RECORDING APPARATUS RICOH COMPANY, LTD. (JP) 2007-05-03 WO disclosed
EP-1698647-A1 POLYMER AND PROCESS FOR PRODUCING POLYMER KANSAI PAINT CO., LTD. (JP) 2006-09-06 EP disclosed
EP-1398360-B1 RADIATION HARDENABLE ADHESIVE COMPOSITION CONTAINING DISPERSED NATURAL RUBBER FINE PARTICLES TOPPAN FORMS CO LTD (JP) 2006-08-16 EP disclosed
US-7081486-B2 Method of producing polymer SHIZUOKA UNIVERSITY (JP) 2006-07-25 US disclosed
EP-1598374-A1 METHOD OF PRODUCING POLYMER Japan as represented by President of Shizuoka University (JP) 2005-11-23 EP disclosed
US-20050143481-A1 Method of producing polymer KANSAI PAINT CO., LTD. (JP) 2005-06-30 US disclosed
US-20050080181-A1 Radiation hardenable adhesive composition containing dispersed natural rubber fine particles TOPPAN FORMS CO., LTD. (JP) 2005-04-14 US disclosed
EP-1398360-A1 RADIATION HARDENABLE ADHESIVE COMPOSITION CONTAINING DISPERSED NATURAL RUBBER FINE PARTICLES Toppan Forms Co., Ltd (JP) 2004-03-17 EP disclosed
EP-0427950-B1 A photosensitive resin composition for use in forming a relief structure ASAHI CHEMICAL IND (JP) 1996-07-17 EP disclosed
US-5336585-A Free of tunnel voids ASAHI KASEI KOGYO KABUSHIKI (JP) 1994-08-09 US disclosed