SCHEMBL8327241

SCHEMBL8327241

CCCC(O)COC(=O)/C=C\C(=O)OCC(O)CCC

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ATM Q13315 2/20 0.47
HCAR2 Q8TDS4 5/20 0.44
TSHR P16473 3/20 0.43
TDP1 Q9NUW8 3/20 0.38
KDM4E B2RXH2 1/20 0.37
DUSP3 P51452 1/20 0.37
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
LMNA P02545 1/20 0.37
MAPT P10636 3/20 0.36
RAB9A P51151 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
CYP3A4 P08684 2/20 0.36
USP2 O75604 1/20 0.36
ALDH1A1 P00352 1/20 0.36
HPGD P15428 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
DGKA P23743 1/20 0.35
CHRM1 P11229 1/20 0.33
AKR1A1 P14550 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9576303 1.00 ATM (0.47) ATMHCAR2TSHRTDP1KDM4E
SCHEMBL8459106 0.93 HCAR2 (0.56) ATMHCAR2TSHRTDP1KDM4E
SCHEMBL8461082 0.88 ATM (0.53) ATMHCAR2TSHRTDP1KDM4E
SCHEMBL9576359 0.88 ATM (0.53) ATMHCAR2TSHRTDP1KDM4E
SCHEMBL9576268 0.86 ATM (0.52) ATMHCAR2TSHRTDP1KDM4E
SCHEMBL9576192 0.85 GPR84 (0.50) ATMHCAR2TSHRKDM4EDUSP3
SCHEMBL960535 0.84 TSHR (0.57) TSHRKDM4EDUSP3MEN1KMT2A
SCHEMBL11050380 0.83 HCAR2 (0.45) ATMHCAR2TSHRTDP1KDM4E
SCHEMBL8326024 0.83 HCAR2 (0.45) ATMHCAR2TSHRTDP1KDM4E
SCHEMBL6049909 0.83 HCAR2 (0.45) ATMHCAR2TSHRTDP1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5972571-A Negative resist composition and use thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1999-10-26 US claimed
US-20210317297-A1 METHODS AND COMPOSITION OF A DENTAL MODEL FOR THE MANUFACTURE OF ORTHODONTIC APPLIANCES WITHOUT THE USE OF SEPARATOR STRUCTO PTE LTD (SG) 2021-10-14 US disclosed
EP-3820398-A1 METHODS AND COMPOSITION OF A DENTAL MODEL FOR THE MANUFACTURE OF ORTHODONTIC APPLIANCES WITHOUT THE USE OF SEPARATOR Structo Pte. Ltd. (SG) 2021-05-19 EP disclosed
US-20130261254-A1 REACTIVE DILUENTS, METHODS OF REACTING, AND THERMOSET POLYMERS DERIVED THEREFROM SEGETIS, INC. (US) 2013-10-03 US disclosed
WO-2013148933-A1 REACTIVE DILUENTS, METHODS OF REACTING, AND THERMOSET POLYMERS DERIVED THEREFROM SEGETIS, INC. (US) 2013-10-03 WO disclosed
EP-0607900-B1 Resin composition for artificial marble, bulk molding compound and sheet molding compound using the same, and process for preparing artificial marble using the same HITACHI CHEMICAL CO LTD (JP) 1999-04-14 EP disclosed
US-5356953-A Resin composition for artificial marble, bulk molding compound and sheet molding compound using the same, and process for preparing artificial marble using the same HITACHI CHEMICAL COMPANY LIMITED (JP) 1994-10-18 US disclosed
EP-0607900-A2 Resin composition for artificial marble, bulk molding compound and sheet molding compound using the same, and process for preparing artificial marble using the same Hitachi Chemical Co., Ltd. (JP) 1994-07-27 EP disclosed
US-5009949-A Resin impregnated substrate HITACHI CHEMICAL COMPANY, LTD. (JP) 1991-04-23 US disclosed
EP-0293112-A2 Resin composition and electrical laminate obtained therefrom Hitachi Chemical Co., Ltd. (JP) 1988-11-30 EP disclosed