SCHEMBL8330146

SCHEMBL8330146

CC(C)CCCCCCCBr

nearest known ligand 0.50

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.50
KDM4C Q9H3R0 2/20 0.32
KDM4A O75164 1/20 0.32
PHF8 Q9UPP1 1/20 0.32
KDM2A Q9Y2K7 1/20 0.32
TRPV1 Q8NER1 1/20 0.32
TRPA1 O75762 1/20 0.32
BLM P54132 1/20 0.31
HIF1A Q16665 1/20 0.31
EPAS1 Q99814 1/20 0.31
ACHE P22303 1/20 0.30
PLA2G1B P04054 1/20 0.30
PLA2G2A P14555 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11076906 1.00 LMNA (0.50) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL10453435 1.00 LMNA (0.50) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL10372645 1.00 LMNA (0.50) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL5883624 1.00 LMNA (0.50) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL8177806 1.00 LMNA (0.50) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL4921966 1.00 LMNA (0.50) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL3098719 1.00 LMNA (0.50) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL31179791 1.00 LMNA (0.50) LMNAKDM4CKDM4APHF8KDM2A
SCHEMBL3180801 1.00
SCHEMBL11071034 1.00 LMNA (0.50) LMNAKDM4CKDM4APHF8KDM2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4684045-A1 AREA SELECTIVE DEPOSITION OF METAL FILM ON SILICON CONTAINING SURFACES UTILIZING HALIDES Versum Materials US, LLC (US) 2026-01-28 EP claimed
WO-2024215931-A1 AREA SELECTIVE DEPOSITION OF METAL FILM ON SILICON CONTAINING SURFACES UTILIZING HALIDES VERSUM MATERIALS US, LLC (US) 2024-10-17 WO claimed
EP-4684045-A1 AREA SELECTIVE DEPOSITION OF METAL FILM ON SILICON CONTAINING SURFACES UTILIZING HALIDES Versum Materials US, LLC (US) 2026-01-28 EP disclosed
WO-2024215931-A1 AREA SELECTIVE DEPOSITION OF METAL FILM ON SILICON CONTAINING SURFACES UTILIZING HALIDES VERSUM MATERIALS US, LLC (US) 2024-10-17 WO disclosed
CN-111954848-B Photosensitive resin composition, cured product, insulating material, resin material for solder resist, and resist member DIC株式会社 2024-05-03 CN disclosed
CN-114409564-B Compound containing trityl structure and application thereof 广州同隽医药科技有限公司 2024-04-26 CN disclosed
CN-112011014-B Resin composition and use thereof 台燿科技股份有限公司 2022-11-22 CN disclosed
CN-109153653-B Novel compound, photocurable composition, cured product thereof, printing ink, and printed matter using the printing ink DIC株式会社 2022-06-28 CN disclosed
CN-114409564-A Compound containing trityl structure and application thereof 广州同隽医药科技有限公司 2022-04-29 CN disclosed
US-11124613-B2 Resin composition and uses of the same TAIWAN UNION TECHNOLOGY CORPORATION (TW) 2021-09-21 US disclosed
US-11079675-B2 Compound, photocurable composition, cured product of same, printing ink, and printed matter curing the printing ink DIC CORPORATION (JP) 2021-08-03 US disclosed
US-20190137872-A1 NOVEL COMPOUND, PHOTOCURABLE COMPOSITION, CURED PRODUCT OF SAME, PRINTING INK, AND PRINTED MATTER SURING THE PRINTING INK DIC CORPORATION (JP) 2019-05-09 US disclosed
US-5886005-A 4-Aza-19-norandrostane derivatives MERCK & CO., INC. (US) 1999-03-23 US disclosed
EP-0804205-A4 4-AZA-19-NORANDROSTANE DERIVATIVES MERCK & CO INC (US) 1998-05-20 EP disclosed
EP-0804205-A1 4-AZA-19-NORANDROSTANE DERIVATIVES Merck & Co., Inc. (US) 1997-11-05 EP disclosed
WO-1996022100-A1 4-AZA-19-NORANDROSTANE DERIVATIVES MERCK & CO., INC. (US) 1996-07-25 WO disclosed
US-5478539-A Solvent extraction by complexing the metal oxyanion with a benzimidazole ZENECA LIMITED (GB) 1995-12-26 US disclosed
US-5213777-A Extraction of uranium values using an imidazole extractant IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1993-05-25 US disclosed
US-4209419-A Certain sulfonamidoquinolines, metal complexes thereof, and solutions containing such sulfonamidoquinolines and metal complexes HENKEL CORPORATION (US) 1980-06-24 US disclosed
US-4100163-A Substituted 8-sulfonamidoquinolines GENERAL MILLS CHEMICALS, INC. (US) 1978-07-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11079675-B2 Compound, photocurable composition, cured product of same, printing ink, and printed matter curing the printing ink EPB41, F12, CDK1 LMNA 740/4885KDM4C 37/4885KDM4A 34/4885
US-20190137872-A1 NOVEL COMPOUND, PHOTOCURABLE COMPOSITION, CURED PRODUCT OF SAME, PRINTING INK, AND PRINTED MATTER SURING THE PRINTING INK EPB41, CDK1, CDKN1A LMNA 926/4885KDM4C 42/4885KDM4A 61/4885
US-11124613-B2 Resin composition and uses of the same C9, RAD51, F12 LMNA 994/4885KDM4C 644/4885KDM4A 717/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.