SCHEMBL83325

SCHEMBL83325

CC(C)(C)c1ccc(C(=O)C(Cl)Cl)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 1/20 0.53
PDPK1 O15530 1/20 0.52
SRD5A2 P31213 1/20 0.52
POLB P06746 1/20 0.52
ALDH1A1 P00352 4/20 0.50
TSHR P16473 1/20 0.50
HSD17B10 Q99714 1/20 0.50
NPC1 O15118 3/20 0.47
RAB9A P51151 3/20 0.47
SMN1; SMN2 Q16637 2/20 0.47
MEN1 O00255 3/20 0.47
KMT2A Q03164 3/20 0.47
HTT P42858 2/20 0.47
MAPT P10636 2/20 0.47
HIF1A Q16665 1/20 0.47
RARB P10826 1/20 0.47
RARG P13631 1/20 0.47
SIRT1 Q96EB6 1/20 0.46
GLA P06280 1/20 0.45
ATM Q13315 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8406967 1.00 HDAC1 (0.53) HDAC1PDPK1SRD5A2POLBALDH1A1
SCHEMBL8974897 0.89 HDAC1 (0.44) HDAC1PDPK1SRD5A2POLBALDH1A1
SCHEMBL11850488 0.86 HDAC1 (0.52) HDAC1SRD5A2POLBALDH1A1TSHR
SCHEMBL31186169 0.82 PDPK1 (0.70) PDPK1TSHRNPC1RAB9ASMN1; SMN2
SCHEMBL11851363 0.81 HDAC1 (0.47) HDAC1SRD5A2POLBALDH1A1TSHR
SCHEMBL28919235 0.81 ALDH1A1 (0.56) HDAC1SRD5A2POLBALDH1A1TSHR
SCHEMBL11451484 0.81 PDPK1 (0.53) HDAC1PDPK1POLBALDH1A1TSHR
SCHEMBL3232491 0.81 HDAC1 (0.55) HDAC1SRD5A2POLBALDH1A1TSHR
SCHEMBL27569665 0.79 SRD5A2 (0.49) HDAC1SRD5A2POLBALDH1A1NPC1
SCHEMBL23571731 0.79 HDAC1 (0.53) HDAC1SRD5A2POLBALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 4323 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117471590-A Antiglare layer and display device 深圳市华星光电半导体显示技术有限公司 2024-01-30 CN claimed
CN-117467340-A Anti-glare composition, anti-glare film, polarizer and display device 深圳市华星光电半导体显示技术有限公司 2024-01-30 CN claimed
CN-114690559-A Photosensitive resin composition, cured film and display device 株式会社东进世美肯 2022-07-01 CN claimed
US-10162259-B2 Photoresist composition and color filter using the same SAMSUNG DISPLAY CO., LTD. (KR) 2018-12-25 US claimed
US-20180074401-A1 PHOTORESIST COMPOSITION AND COLOR FILTER USING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2018-03-15 US claimed
US-9631068-B2 Photo-curable resin composition and method for forming a fine pattern using the same SAMSUNG DISPLAY CO., LTD. (KR) 2017-04-25 US claimed
US-9567494-B2 Double-sided adhesive tape DEXERIALS CORPORATION (JP) 2017-02-14 US claimed
US-20160272791-A1 PHOTO-CURABLE RESIN COMPOSITION AND METHOD FOR FORMING A FINE PATTERN USING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2016-09-22 US claimed
US-20160062180-A1 COLOR FILTER COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2016-03-03 US claimed
US-20160060527-A1 COLOR FILTER COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE SAME SAMSUNG DISPLAY CO LTD (KR) 2016-03-03 US claimed
US-6855480-B2 Photoresist composition SHIPLEY COMPANY, L.L.C. (US) 2005-02-15 US claimed
US-6818375-B2 FOR MANUFACTURING PRINTED WIRING BOARDS ETERNAL TECHNOLOGY CORPORATION 2004-11-16 US claimed
WO-2004072736-A1 AG PASTE COMPOSITION FOR MICROELECTRODE FORMATION AND MICROELECTRODE FORMED USING THE SAME DONGJIN SEMICHEM CO. LTD. (KR) 2004-08-26 WO claimed
US-20030059709-A1 Photoresist composition SHIPLEY COMPANY, L.L.C. 2003-03-27 US claimed
US-20030022098-A1 Photoresist composition SHIPLEY COMPANY, L.L.C. 2003-01-30 US claimed
EP-1251399-A2 Photoresist composition Shipley Company LLC (US) 2002-10-23 EP claimed
US-20020132180-A1 Photoresist composition SHIPLEY COMPANY, L.L.C. (US) 2002-09-19 US claimed
US-6207347-B1 URETHANE BIURET OLIGOMER. NICHIGO-MORTON CO. LTD. (JP) 2001-03-27 US claimed
US-5824180-A CYANOACRYLATE ADHESIVE, METALLOCENE CURING ACCELERATOR THREE BOND CO., LTD. (JP) 1998-10-20 US claimed
US-5756190-A NOVOLAK EPOXY RESIN, CURING AGENT, DILUENT, PHOTOPOLYMERIZATION CATALYST SUMITOMO BAKELITE COMPANY LIMITED (JP) 1998-05-26 US claimed