SCHEMBL8334840

SCHEMBL8334840

C=CC(=O)OOCCCCCCOOC(=O)c1ccccc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 5/20 0.49
LMNA P02545 3/20 0.47
F2 P00734 1/20 0.47
THRB P10828 2/20 0.42
TSHR P16473 3/20 0.41
ALDH1A1 P00352 3/20 0.41
CYP3A4 P08684 2/20 0.41
AKT1 P31749 1/20 0.41
HSD17B10 Q99714 1/20 0.39
LSS P48449 2/20 0.37
CYP1A2 P05177 1/20 0.37
CYP2C9 P11712 1/20 0.37
CYP2C19 P33261 1/20 0.37
KMT2A Q03164 2/20 0.37
MAPK1 P28482 1/20 0.37
HIF1A Q16665 1/20 0.37
SLC6A2 P23975 1/20 0.37
SLC6A3 Q01959 1/20 0.37
THRA P10827 1/20 0.36
L3MBTL1 Q9Y468 3/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10869069 0.91 TSHR (0.54) TDP1LMNAF2THRBTSHR
SCHEMBL8334837 0.91 TDP1 (0.63) TDP1LMNATHRBTSHRALDH1A1
SCHEMBL10868377 0.91 TSHR (0.54) TDP1LMNAF2THRBTSHR
SCHEMBL8719254 0.91 TSHR (0.54) TDP1LMNAF2THRBTSHR
SCHEMBL10869207 0.91 TSHR (0.54) TDP1LMNAF2THRBTSHR
SCHEMBL10868865 0.91 TSHR (0.54) TDP1LMNAF2THRBTSHR
SCHEMBL10868720 0.91 TSHR (0.54) TDP1LMNAF2THRBTSHR
SCHEMBL10868646 0.91 TSHR (0.54) TDP1LMNAF2THRBTSHR
SCHEMBL1247174 0.90 TDP1 (0.56) TDP1LMNAF2THRBTSHR
SCHEMBL21834000 0.87 TDP1 (0.62) TDP1LMNAF2TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5929953-A Light control element and method of manufacturing the same FUJI XEROX CO., LTD. (JP) 1999-07-27 US disclosed
US-5872609-A Light control element method of manufacturing the same FUJI XEROX CO., LTD. (JP) 1999-02-16 US disclosed