SCHEMBL8334837

SCHEMBL8334837

C=CC(=O)OOCCCCCCOC(=O)c1ccccc1

nearest known ligand 0.63

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.63
LMNA P02545 2/20 0.47
ALDH1A1 P00352 3/20 0.46
TSHR P16473 2/20 0.46
CYP3A4 P08684 1/20 0.46
THRB P10828 1/20 0.43
BCHE P06276 2/20 0.42
MAPK1 P28482 1/20 0.41
HIF1A Q16665 1/20 0.41
SLC6A2 P23975 1/20 0.41
SLC6A3 Q01959 1/20 0.41
KMT2A Q03164 1/20 0.41
NPC1 O15118 1/20 0.41
MAPT P10636 1/20 0.41
RAB9A P51151 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP2C9 P11712 1/20 0.41
CYP2C19 P33261 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8334840 0.91 TDP1 (0.49) TDP1LMNAALDH1A1TSHRCYP3A4
SCHEMBL10868720 0.89 TSHR (0.54) TDP1LMNAALDH1A1TSHRCYP3A4
SCHEMBL10868646 0.89 TSHR (0.54) TDP1LMNAALDH1A1TSHRCYP3A4
SCHEMBL10869069 0.89 TSHR (0.54) TDP1LMNAALDH1A1TSHRCYP3A4
SCHEMBL10868865 0.89 TSHR (0.54) TDP1LMNAALDH1A1TSHRCYP3A4
SCHEMBL8719254 0.89 TSHR (0.54) TDP1LMNAALDH1A1TSHRCYP3A4
SCHEMBL10869207 0.89 TSHR (0.54) TDP1LMNAALDH1A1TSHRCYP3A4
SCHEMBL10868377 0.89 TSHR (0.54) TDP1LMNAALDH1A1TSHRCYP3A4
SCHEMBL9647800 0.88 TDP1 (0.71) TDP1LMNAALDH1A1TSHRCYP3A4
SCHEMBL8729392 0.88 TDP1 (0.71) TDP1LMNAALDH1A1TSHRCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5929953-A Light control element and method of manufacturing the same FUJI XEROX CO., LTD. (JP) 1999-07-27 US disclosed
US-5872609-A Light control element method of manufacturing the same FUJI XEROX CO., LTD. (JP) 1999-02-16 US disclosed