SCHEMBL8342105

SCHEMBL8342105

Cc1ccc(O)c(-c2cccc(O)c2C=O)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.41
MEN1 O00255 4/20 0.41
KMT2A Q03164 4/20 0.41
TDP1 Q9NUW8 4/20 0.41
USP2 O75604 3/20 0.41
ALDH1A1 P00352 3/20 0.41
KDM4E B2RXH2 2/20 0.41
ELANE P08246 2/20 0.41
MAPK1 P28482 2/20 0.41
CYP3A4 P08684 1/20 0.41
TSHR P16473 1/20 0.41
BRCA1 P38398 1/20 0.41
RECQL P46063 1/20 0.41
TRPA1 O75762 1/20 0.39
MAOA P21397 1/20 0.39
MAOB P27338 1/20 0.39
HPGD P15428 4/20 0.39
ERN1 O75460 3/20 0.39
ALOX15 P16050 3/20 0.39
POLB P06746 3/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5335160 0.79 MEN1 (0.40) MAPTMEN1KMT2ATDP1USP2
SCHEMBL8342262 0.79 TRPA1 (0.43) MAPTMEN1KMT2ATDP1ALDH1A1
SCHEMBL9152842 0.78 TRIM24 (0.47) MAPTMEN1KMT2ATDP1USP2
SCHEMBL31351790 0.78 TRPA1 (0.52) MAPTMEN1KMT2ATDP1USP2
SCHEMBL3484810 0.78 TRPA1 (0.52) MAPTMEN1KMT2ATDP1USP2
SCHEMBL3967211 0.77 ATM (0.42) MAPTMEN1KMT2AUSP2ALDH1A1
SCHEMBL18723199 0.77 TRPA1 (0.46) MAPTMEN1KMT2ATDP1USP2
SCHEMBL30570212 0.77 TRPA1 (0.46) MAPTMEN1KMT2ATDP1USP2
SCHEMBL9754479 0.77 MAPT (0.44) MAPTMEN1KMT2ATDP1USP2
SCHEMBL7094219 0.76 ELANE (0.42) MAPTMEN1KMT2ATDP1USP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5939511-A A SOLUTION OF THE RESIN IS FORMED IN A WATER INSOLUBLE ORGANIC SOLVENT FOLLOWED BY LIQUID-LIQUID EXTRACTION WITH WATER; REMOVES ACID RESIDUES AND METALLIC IMPURITIES; HIGH PURITY PHENOLIC RESINS FOR PHOTORESISTS SHIPLEY COMPANY, L.L.C. (US) 1999-08-17 US disclosed
US-5789522-A EXTRACTION OF PHENOLIC RESINS WITH SOLVENT USED FOR PHOTORESIST COATINGS SHIPLEY COMPANY, L.L.C. (US) 1998-08-04 US disclosed