SCHEMBL8350616

SCHEMBL8350616

CCOCC1CCO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26039174 0.89
SCHEMBL1002690 0.89
SCHEMBL2909785 0.87 PDK1 (0.47)
SCHEMBL13301287 0.87 SMN1; SMN2 (0.48)
SCHEMBL1838719 0.87 PDK1 (0.47)
SCHEMBL1195725 0.84 TSHR (0.48)
SCHEMBL23592614 0.82 SLC6A4 (0.41)
SCHEMBL26851898 0.82 PDK1 (0.43)
SCHEMBL13444691 0.81
SCHEMBL8515087 0.81 SMN1; SMN2 (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-1999021808-A1 ENERGETIC OXETANE PROPELLANTS CORDANT TECHNOLOGIES, INC. (US) 1999-05-06 WO claimed
CN-107207906-B Resin composition for hard coat layer and hard coat film comprising cured form thereof as coating layer 可隆工业株式会社 2020-11-24 CN disclosed
CN-105246940-B Optical semiconductor sealing solidification compound 株式会社大赛璐 2018-09-04 CN disclosed
EP-3010925-B1 BACE INHIBITORS LILLY CO ELI (US) 2017-10-04 EP disclosed
CN-105246940-A Curable composition for sealing optical semiconductor DAICEL CORP 2016-01-13 CN disclosed
US-8449794-B2 Non-resonant two-photon absorption recording material and non-resonant two-photon absorption compound FUJIFILM CORPORATION (JP) 2013-05-28 US disclosed
US-20120319059-A1 NON-RESONANT TWO-PHOTON ABSORPTION RECORDING MATERIAL AND NON-RESONANT TWO-PHOTON ABSORPTION COMPOUND FUJIFILM CORPORATION (JP) 2012-12-20 US disclosed
US-20100078607-A1 NON-RESONANT TWO-PHOTON ABSORPTION RECORDING MATERIAL AND NON-RESONANT TWO-PHOTON ABSORPTION COMPOUND FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
US-20090103153-A1 HOLOGRAPHIC RECORDING AND READING METHOD AND HOLOGRAPHIC RECORDING AND READING APPARATUS FUJIFILM CORPORATION (JP) 2009-04-23 US disclosed
US-20090088490-A1 TWO-PHOTON ABSORPTION RECORDING MATERIAL CONTAINING DYE HAVING POLYMERIZABLE GROUP FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20090051988-A1 HOLOGRAPHIC RECORDING MEDIUM AND HOLOGRAPHIC RECORDING APPARATUS FUJIFILM CORPORATION (JP) 2009-02-26 US disclosed