Edetic Acid

Edetic Acid

SCHEMBL8352008

O=C(O)CN(CCN(CC(=O)O)CC(=O)O)CC(=O)O.O=C(O)c1cccc2c1OCC2

nearest known ligand 0.56

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PARP1 P09874 2/20 0.56
KCNA3 P22001 1/20 0.39
MAPK14 Q16539 1/20 0.38
RORC P51449 1/20 0.38
TDP1 Q9NUW8 2/20 0.38
EYA2 O00167 1/20 0.38
APP P05067 1/20 0.38
ACE P12821 1/20 0.38
HCRTR1 O43613 1/20 0.37
HCRTR2 O43614 1/20 0.37
KDM4E B2RXH2 1/20 0.37
LMNA P02545 1/20 0.37
CHRM2 P08172 1/20 0.37
ADRA2A P08913 1/20 0.37
ALOX15 P16050 1/20 0.37
TSHR P16473 1/20 0.37
DRD1 P21728 1/20 0.37
SLC6A2 P23975 1/20 0.37
SLC6A4 P31645 1/20 0.37
CYP2C19 P33261 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL729580 0.85 PARP1 (0.74) PARP1MAPK14RORCHCRTR1HCRTR2
Hydrochloric Acid SCHEMBL7265489 0.84 PARP1 (0.72) PARP1KCNA3MAPK14RORCHCRTR1
SCHEMBL30251654 0.76 PARP1 (0.60) PARP1RORCHCRTR1HCRTR2KDM4E
SCHEMBL984448 0.76 PARP1 (0.60) PARP1RORCHCRTR1HCRTR2KDM4E
SCHEMBL7322972 0.75 PARP1 (0.58) PARP1RORCALOX15
Edetic Acid SCHEMBL17183002 0.74 ALDH1A1 (0.58) TDP1EYA2APPACEKDM4E
SCHEMBL7471201 0.74 PARP1 (0.57) PARP1RORCTDP1KDM4E
SCHEMBL21804730 0.73 PARP1 (0.70) PARP1KCNA3MAPK14RORCHCRTR1
SCHEMBL1502069 0.73 PARP1 (1.00) PARP1RORCHCRTR1HCRTR2KDM4E
Oxalic Acid SCHEMBL17978250 0.72 PARP1 (0.90) PARP1MAPK14RORCHCRTR1HCRTR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5965660-A POLYAMINES HAVING N-PHOSPHO- OR PHOSPHATO-METHYL GROUPS OR ADDITION POLYMERS HAVING THE SAME N-PENDANT GROUPS; POLLUTION CONTROL; STORAGE STABILITY; CONTINUOUS USE; REDUCED ETCHING TIME; ANTISOILANTS FUJI PHOTO FILM CO., LTD. (JP) 1999-10-12 US disclosed