Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 3/20 | 0.50 |
| ▸ | MAPT | P10636 | 5/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.45 |
| ▸ | MEN1 | O00255 | 4/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.43 |
| ▸ | HSP90AB1 | P08238 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3314693 | 0.95 | GAA (0.54) | GAAMAPTKDM4EALDH1A1L3MBTL1 | |
| Hydrochloric Acid SCHEMBL10872221 | 0.93 | GAA (0.53) | GAAMAPTKDM4EALDH1A1L3MBTL1 | |
| SCHEMBL11152353 | 0.93 | GAA (0.53) | GAAMAPTKDM4EALDH1A1L3MBTL1 | |
| Hydrochloric Acid SCHEMBL7026130 | 0.92 | GAA (0.52) | GAAMAPTKDM4EALDH1A1L3MBTL1 | |
| Hydrochloric Acid SCHEMBL8415162 | 0.92 | GAA (0.52) | GAAMAPTKDM4EALDH1A1L3MBTL1 | |
| Fluoride Ion SCHEMBL11152351 | 0.92 | GAA (0.52) | GAAMAPTKDM4EALDH1A1L3MBTL1 | |
| Hydrochloric Acid SCHEMBL7026128 | 0.92 | GAA (0.52) | GAAMAPTKDM4EALDH1A1L3MBTL1 | |
| SCHEMBL11332195 | 0.91 | GAA (0.51) | GAAMAPTKDM4EALDH1A1L3MBTL1 | |
| Hydrochloric Acid SCHEMBL8415161 | 0.91 | GAA (0.51) | GAAMAPTKDM4EALDH1A1L3MBTL1 | |
| SCHEMBL11394193 | 0.90 | GAA (0.48) | GAAMAPTKDM4EALDH1A1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-59230792-A | — | — | None | — | — | JP | disclosed |
| JP-59230791-A | — | — | None | — | — | JP | disclosed |
| JP-59230789-A | — | — | None | — | — | JP | disclosed |
| JP-59230790-A | — | — | None | — | — | JP | disclosed |
| JP-59230788-A | — | — | None | — | — | JP | disclosed |
| US-5994029-A | MONODISPERSED PARTICLES | AGFA-GEVAERT AG (DE) | 1999-11-30 | — | — | US | disclosed |
| EP-0441638-B1 | Light sensitive litho printing plate | KONISHIROKU PHOTO IND (JP) | 1999-10-13 | — | — | EP | disclosed |
| US-5188924-A | Dimensional precision, stability | KABUSHIKI KAISHA TOSHIBA (JP) | 1993-02-23 | — | — | US | disclosed |
| EP-0161660-B1 | PATTERN FORMING METHOD AND COMPOSITION FOR PATTERN FORMATION TO BE USED THEREFOR | KABUSHIKI KAISHA TOSHIBA (JP) | 1991-10-09 | — | — | EP | disclosed |
| EP-0441638-A2 | Light sensitive litho printing plate | KONICA CORPORATION (JP) | 1991-08-14 | — | — | EP | disclosed |
| EP-0036036-A2 | Vesicular film elements | R.Q.O. Holding Company,Inc. (US) | 1981-09-23 | — | — | EP | disclosed |
| US-4284704-A | Photographic elements with incorporated hydrogen source photoreductant and tetrazolium salt | EASTMAN KODAK COMPANY (US) | 1981-08-18 | — | — | US | disclosed |
| US-4252592-A | Method of making epoxide resin-impregnated composites | CIBA-GEIGY CORPORATION (US) | 1981-02-24 | — | — | US | disclosed |
| US-4224397-A | Continuous tone diazo material | TRANS WORLD TECHNOLOGY LABORATORIES INC. (TWT LABS, INC.) (US) | 1980-09-23 | — | — | US | disclosed |
| US-4218279-A | Bonding method employing film adhesives containing an epoxide resin | CIBA-GEIGY CORPORATION (US) | 1980-08-19 | — | — | US | disclosed |
| US-4207110-A | 2,5-DIALKOXY-4-MORPHOLINO-BENZENE DIAZONIUM SALT AND COUPLER COMBINATION TO GIVE BLACK IMAGE | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-06-10 | — | — | US | disclosed |
| US-4201588-A | NONSILVER PHOTOGRAPHIC FILMS; DISULFIDE, DIAZOANTHRONE, DIAZOPHENANTHRONE, AROMATIC AZIDE, CARBAZIDES OR QUINONES AS PHOTOREDUCTANT; EXTERNAL HYDROGEN SOURCE | EASTMAN KODAK COMPANY (US) | 1980-05-06 | — | — | US | disclosed |
| US-4148646-A | FOR MAKING DUPLICATES OF X-RAY FILMS | TRANS WORLD TECHNOLOGY LABORATORIES, INC. (US) | 1979-04-10 | — | — | US | disclosed |
| US-4101323-A | Radiation-sensitive copying composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1978-07-18 | — | — | US | disclosed |
| US-4055425-A | DIAZOIMINO COMPOUND | GAF CORPORATION (US) | 1977-10-25 | — | — | US | disclosed |