SCHEMBL8367174

SCHEMBL8367174

C1=CCCCCCCCCCC1.C1=CCCCCCCCCCC1.C1=CCCCCCCCCCC1.C1=CCCCCCCCCCC1.CC1CC2C=CC1C2

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.30
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18429072 1.00 KDM4E (0.30) KDM4EALDH1A1
SCHEMBL10075352 0.84
SCHEMBL49584 0.84
SCHEMBL24404787 0.84
Ammonia Solution, Strong SCHEMBL28780636 0.82
SCHEMBL10587012 0.77 KDM4E (0.31) KDM4EALDH1A1
Acetic Acid SCHEMBL17385972 0.72 KDM4E (0.42) KDM4EALDH1A1
Propionic Acid SCHEMBL5079079 0.72 KDM4E (0.39) KDM4EALDH1A1
Cyclooctene SCHEMBL21712675 0.67
SCHEMBL5163917 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10072141-B2 Resin composition, resin molded article, and method of preparing resin composition FUJI XEROX CO., LTD. (JP) 2018-09-11 US disclosed
US-20170037232-A1 RESIN COMPOSITION, RESIN MOLDED ARTICLE, AND METHOD OF PREPARING RESIN COMPOSITION FUJI XEROX CO., LTD. (JP) 2017-02-09 US disclosed
EP-0777526-B1 FILTER MATERIAL AND PROCESS FOR REMOVING OZONE FROM GASES AND LIQUIDS TICONA GMBH (DE) 1999-01-07 EP disclosed