⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7170809 | 0.75 | — | — | |
| SCHEMBL13370050 | 0.71 | — | — | |
| SCHEMBL3671527 | 0.70 | TRPA1 (0.31) | — | |
| SCHEMBL14307481 | 0.69 | HRH3 (0.40) | — | |
| SCHEMBL1048548 | 0.66 | — | — | |
| SCHEMBL11713974 | 0.65 | TLR4 (0.32) | — | |
| SCHEMBL22909937 | 0.64 | TLR4 (0.31) | — | |
| SCHEMBL3673038 | 0.63 | — | — | |
| SCHEMBL4136281 | 0.60 | — | — | |
| SCHEMBL14819040 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3159057-B1 | PRODUCTION METHOD OF PURIFIED LIQUID CHEMICAL PRODUCT FOR LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2022-07-27 | — | — | EP | disclosed |
| CN-106552517-B | Barrier filter, method for filtering, method for producing purified product of liquid chemical for lithography, and method for forming resist pattern | 东京应化工业株式会社 | 2021-10-26 | — | — | CN | disclosed |
| US-10678129-B2 | Composition for nanoimprint, cured product, pattern forming method, and article having pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-09 | — | — | US | disclosed |
| US-10429738-B2 | Filtration filter, filtration method, production method of purified liquid chemical product for lithography, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-10-01 | — | — | US | disclosed |
| EP-3159057-A2 | FILTRATION FILTER, FILTRATION METHOD, PRODUCTION METHOD OF PURIFIED LIQUID CHEMICAL PRODUCT FOR LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-26 | — | — | EP | disclosed |
| CN-106552517-A | Barrier filter and filter method, photoetching medicinal liquid purify the manufacture method and Resist patterns forming method of product | 东京应化工业株式会社 | 2017-04-05 | — | — | CN | disclosed |
| US-20170090293-A1 | FILTRATION FILTER, FILTRATION METHOD, PRODUCTION METHOD OF PURIFIED LIQUID CHEMICAL PRODUCT FOR LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-03-30 | — | — | US | disclosed |
| US-20160363858-A1 | COMPOSITION FOR NANOIMPRINT, CURED PRODUCT, PATTERN FORMING METHOD, AND ARTICLE HAVING PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-12-15 | — | — | US | disclosed |
| EP-0661310-B1 | Cyclo-olefincopolymers and process for their preparation | TICONA GMBH (DE) | 1999-07-21 | — | — | EP | disclosed |
| EP-0661308-B1 | Cyclo-olefin copolymers and process for their preparation | TICONA GMBH (DE) | 1999-06-02 | — | — | EP | disclosed |
| US-5756623-A | MOLDING MATERIALS FOR COMPRESSION MOLDING | HOECHST AG (DE) | 1998-05-26 | — | — | US | disclosed |
| CN-1108264-A | Cycloolefins copolymer and preparation of same | HOECHST AG (DE) | 1995-09-13 | — | — | CN | disclosed |
| CN-1106826-A | Cycloolefin copolymer and preparation of same | HOECHST AG (DE) | 1995-08-16 | — | — | CN | disclosed |
| EP-0661310-A2 | Cyclo-olefincopolymers and process for their preparation | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-07-05 | — | — | EP | disclosed |
| EP-0661308-A2 | Cyclo-olefin copolymers and process for their preparation | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-07-05 | — | — | EP | disclosed |