SCHEMBL8378352

SCHEMBL8378352

IC1Cc2ccccc2C1I

nearest known ligand 0.45

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
GRIN2D O15399 1/20 0.42
GRIN3B O60391 1/20 0.42
GRIN1 Q05586 1/20 0.42
GRIN2A Q12879 1/20 0.42
GRIN2B Q13224 1/20 0.42
GRIN2C Q14957 1/20 0.42
GRIN3A Q8TCU5 1/20 0.42
KDM1A O60341 4/20 0.41
CHRNB2 P17787 3/20 0.41
CHRNA4 P43681 3/20 0.41
HTR2A P28223 1/20 0.38
SIGMAR1 Q99720 2/20 0.37
OPRM1 P35372 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18772351 0.77 OPRM1 (0.42) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL8382716 0.77 GRIN2D (0.39) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL12557463 0.77 ANPEP (0.40) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL23343759 0.77 ANPEP (0.40) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL8378339 0.77 GRIN2D (0.39) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL23343868 0.77 ANPEP (0.40) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL8382715 0.77 GRIN2D (0.39) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL8067624 0.77 GRIN2D (0.39) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL8378364 0.77 GRIN2D (0.39) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B
SCHEMBL8380253 0.77 ANPEP (0.40) GRIN2DGRIN3BGRIN1GRIN2AGRIN2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230367214-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-16 US disclosed
US-20230194986-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-22 US disclosed
EP-3032332-B1 SHRINK MATERIAL AND PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2017-04-05 EP disclosed
EP-2105794-B1 Novel photoacid generator, resist composition, and patterning process SHINETSU CHEMICAL CO (JP) 2015-08-19 EP disclosed
EP-0658537-B1 Method of producing cis-1-aminoindan-2-ol ICHIKAWA GOSEI KAGAKU KK (JP) 1999-03-31 EP disclosed
US-5760242-A Method of producing a cis-oxazoline ICHIKAWA GOSEI CHEMICAL CO., LTD. (JP) 1998-06-02 US disclosed
US-5648534-A Method of producing cis-1-aminoindan-2-ol ICHIKAWA GOSEI CHEMICAL CO., LTD. (JP) 1997-07-15 US disclosed
EP-0658537-A1 Method of producing cis-1-aminoindan-2-ol ICHIKAWA GOSEI CHEMICAL CO., LTD. (JP) 1995-06-21 EP disclosed