SCHEMBL837852

SCHEMBL837852

[CH2]N1CCCC(C)(C)C1(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL487378 0.78 SOS1 (0.30)
Ammonia Solution, Strong SCHEMBL28924970 0.76
Iodide SCHEMBL1885520 0.76
Hydrochloric Acid SCHEMBL28491334 0.76
SCHEMBL28998095 0.70 SOS1 (0.33)
SCHEMBL301535 0.68
SCHEMBL31454145 0.68
SCHEMBL6049394 0.68
SCHEMBL31055748 0.68
SCHEMBL727662 0.68 GAA (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2223804-B1 Lithographic printing plate precursor and plate making method thereof FUJIFILM CORP (JP) 2016-04-06 EP disclosed
EP-1887423-B1 Laser-decomposable resin composition and pattern-forming material using the same FUJIFILM CORP (JP) 2016-01-27 EP disclosed
US-9162972-B2 Method for production of hydroxycarboxylic acid amide compounds and novel arylboronic acid compound NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY (JP) 2015-10-20 US disclosed
US-20150011766-A1 METHOD FOR PRODUCTION OF HYDROXYCARBOXYLIC ACID AMIDE COMPOUNDS AND NOVEL ARYLBORONIC ACID COMPOUND NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY (JP) 2015-01-08 US disclosed
EP-2816026-A1 PRODUCTION METHOD FOR HYDROXY-CARBOXYLIC ACID AMIDE COMPOUND, AND NOVEL ARYLBORONIC ACID COMPOUND National University Corporation Nagoya University (JP) 2014-12-24 EP disclosed
EP-2592475-B1 Photosensitive composition, lithographic printing plate precursor, lithographic printing method, and novel cyanine dyes FUJIFILM CORP (JP) 2014-11-26 EP disclosed
EP-2592475-A1 Photosensitive composition, lithographic printing plate precursor, lithographic printing method, and novel cyanine dyes Fujifilm Corporation (JP) 2013-05-15 EP disclosed
US-8426102-B2 Lithographic printing plate precursor and plate making method FUJIFILM CORPORATION (JP) 2013-04-23 US disclosed
US-8371219-B2 Lithographic printing plate precursor and plate making method thereof FUJIFILM CORPORATION (JP) 2013-02-12 US disclosed
US-8309294-B2 2012-11-13 US disclosed
US-20050037282-A1 Lithographic printing plate precursor and lithographic printing method FUJIFILM CORPORATION (JP) 2005-02-17 US disclosed
EP-1506855-A2 Lithographic printing plate precursor and lithographic printing method FUJI PHOTO FILM CO., LTD. (JP) 2005-02-16 EP disclosed
EP-1449651-A2 Polymerizable composition and lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2004-08-25 EP disclosed
EP-1445120-A2 Photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2004-08-11 EP disclosed
US-6727044-B1 LASER SCANNING LITHOGRAPHIC PRINTING ORIGINAL PLATE WHICH CAN PROVIDE A PRINTING PLATE HAVING A SUFFICIENTLY LONG PRESS LIFE EVEN BY HIGH-SPEED SCAN EXPOSURE AND CAUSES LITTLE FLUCTUATION IN THE PRINTING PERFORMANCE OF THE PRINTING PLATE FUJI PHOTO FILM CO., LTD. (JP) 2004-04-27 US disclosed
US-20040072101-A1 Polymerizable composition and planographic printing plate precursor FUJI PHOTO FILM CO., LTD. 2004-04-15 US disclosed
EP-1403043-A2 Polymerizable composition and planographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2004-03-31 EP disclosed
US-6153660-A VERY HIGH SENSITIVITY TO BEAMS IN THE VISIBLE REGION, PARTICULARLY TO VISIBLE RAYS AT 400 NM OR MORE SUCH AS RAYS AT 488 NM OR 532 NM CORRESPONDING TO THE OUTPUT OF AR+ LASER OR YAG-SHG LASER FUJI PHOTO FILM CO., LTD. (JP) 2000-11-28 US disclosed
EP-0949540-A1 Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition FUJI PHOTO FILM CO., LTD (JP) 1999-10-13 EP disclosed
EP-0924570-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1999-06-23 EP disclosed