SCHEMBL8385759

SCHEMBL8385759

CC[SiH](CC)[SiH2][SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8385751 0.72
SCHEMBL8383917 0.67 TSHR (0.33)
SCHEMBL8380605 0.67
SCHEMBL3482545 0.65
SCHEMBL8380451 0.64
SCHEMBL8381362 0.62
SCHEMBL8382734 0.61
SCHEMBL8384957 0.59
SCHEMBL8381402 0.56
SCHEMBL331662 0.56

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2855018-B1 PROCESS OF PREPARATION OF A CATALYST COMPRISING A GROUP VIII METAL AND SILICON AND PROCESS OF SELECTIVE HYDROGENATION USING THAT CATALYST IFP ENERGIES NOW (FR) 2017-10-18 EP disclosed
US-9695095-B2 Process for preparing a catalyst based on a group VIII metal and containing silicon, and a process of selective hydrogenation implementing said catalyst IFP Energies Nouvelles (FR) 2017-07-04 US disclosed
US-20150141718-A1 PROCESS FOR PREPARING A CATALYST BASED ON A GROUP VIII METAL AND CONTAINING SILICON, AND A PROCESS OF SELECTIVE HYDROGENATION IMPLEMENTING SAID CATALYST IFP Energies Nouvelles (FR) 2015-05-21 US disclosed
EP-2855018-A1 PROCESS FOR PREPARING A CATALYST BASED ON A GROUP VIII METAL AND CONTAINING SILICON AND SELECTIVE HYDROGENATION PROCESS USING SAID CATALYST IFP Energies nouvelles (FR) 2015-04-08 EP disclosed
WO-2013175085-A1 PROCESS FOR PREPARING A CATALYST BASED ON A GROUP VIII METAL AND CONTAINING SILICON AND SELECTIVE HYDROGENATION PROCESS USING SAID CATALYST IFP Energies Nouvelles (FR) 2013-11-28 WO disclosed
CN-1774523-A Volatile copper(I) complexes for deposition of copper films by atomic layer deposition DU PONT (US) 2006-05-17 CN disclosed
EP-0630933-B1 A method of producing a semiconducting material NIPPON OIL CO LTD (JP) 1999-04-14 EP disclosed
US-5700400-A Method for producing a semiconducting material NIPPON OIL CO., LTD. (JP) 1997-12-23 US disclosed
EP-0551771-B1 Process for producing polysilanes NIPPON OIL CO LTD (JP) 1997-07-30 EP disclosed
US-5620531-A Photovoltaic element NIPPON OIL CO., LTD. (JP) 1997-04-15 US disclosed
EP-0717451-A2 Photovoltaic element NIPPON OIL CO., LTD. (JP) 1996-06-19 EP disclosed
EP-0630933-A2 A method of producing a semiconducting material NIPPON OIL CO. LTD. (JP) 1994-12-28 EP disclosed
US-5304622-A Process for producing polysilanes NIPPON OIL COMPANY, LTD. (JP) 1994-04-19 US disclosed
EP-0551771-A2 Process for producing polysilanes NIPPON OIL CO. LTD. (JP) 1993-07-21 EP disclosed