SCHEMBL8385877

SCHEMBL8385877

Nc1ccc(OP(=O)(O)OO)c2ccccc12

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 3/20 0.49
EP300 Q09472 2/20 0.47
KAT8 Q9H7Z6 2/20 0.47
HDAC3 O15379 1/20 0.40
KAT2B Q92831 1/20 0.40
NCOR2 Q9Y618 1/20 0.40
ALDH1A1 P00352 2/20 0.34
CYP3A4 P08684 1/20 0.34
HPGD P15428 1/20 0.34
TSHR P16473 1/20 0.34
HSD17B10 Q99714 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
GPR84 Q9NQS5 2/20 0.34
CHEK1 O14757 1/20 0.33
NEK2 P51955 1/20 0.33
LIMK1 P53667 1/20 0.33
DYRK1A Q13627 1/20 0.33
CLK4 Q9HAZ1 1/20 0.33
HTT P42858 1/20 0.33
CDC25B P30305 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2547022 0.84 IDO1 (0.53) IDO1EP300KAT8HDAC3KAT2B
SCHEMBL2547019 0.80 IDO1 (0.57) IDO1EP300KAT8HDAC3KAT2B
SCHEMBL3717591 0.76 HTT (0.50) ALDH1A1HPGDHSD17B10TDP1GPR84
SCHEMBL4687323 0.69 IDO1 (0.68) IDO1EP300KAT8HDAC3KAT2B
SCHEMBL28841735 0.68 IDO1 (0.55) IDO1EP300KAT8HDAC3KAT2B
Phosphoric Acid SCHEMBL8776747 0.67 IDO1 (0.79) IDO1EP300KAT8HDAC3KAT2B
SCHEMBL8386304 0.67 IDO1 (0.48) IDO1EP300KAT8HDAC3KAT2B
SCHEMBL29414155 0.67 IDO1 (0.53) IDO1EP300KAT8HDAC3KAT2B
SCHEMBL2618026 0.67 IDO1 (0.53) IDO1EP300KAT8HDAC3KAT2B
SCHEMBL11124814 0.67 IDO1 (0.53) IDO1EP300KAT8HDAC3KAT2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10876082-B2 Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate FUJIMI INCORPORATED (JP) 2020-12-29 US disclosed
US-20190085270-A1 SURFACE TREATMENT COMPOSITION, METHOD FOR PRODUCING SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2019-03-21 US disclosed
EP-0487343-B1 Process for preparing a lithographic plate FUJI PHOTO FILM CO LTD (JP) 1999-04-28 EP disclosed
EP-0487343-A1 Process for preparing a lithographic plate Fuji Photo Film Co., Ltd. (JP) 1992-05-27 EP disclosed