SCHEMBL8404265

SCHEMBL8404265

O=C(O)C1=C(C(=O)O)C(C(=O)O)(C(=O)O)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3783619 0.75
Hydrochloric Acid SCHEMBL8987261 0.73
SCHEMBL3264588 0.72 CYP2C19 (0.30)
SCHEMBL27457601 0.64
SCHEMBL1337924 0.63 GRM8 (0.38)
SCHEMBL23501553 0.62 GRM4 (0.34)
SCHEMBL11762994 0.61 AKR1C1 (0.39)
SCHEMBL31072354 0.61 FFAR3 (0.41)
SCHEMBL168735 0.60 PYGM (0.35)
SCHEMBL11430568 0.60 FFAR3 (0.36)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12516139-B2 Resin composition, resin sheet, multilayer printed wiring board, and semiconductor device MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-01-06 US disclosed
EP-4321541-B1 RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD AND SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL CO (JP) 2025-08-06 EP disclosed
US-12221523-B2 Resin composition, resin sheet, multilayer printed wiring board, and semiconductor device MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-02-11 US disclosed
EP-4074740-B1 RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL CO (JP) 2024-11-20 EP disclosed
US-20240309127-A1 RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-09-19 US disclosed
US-20240287219-A1 RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-08-29 US disclosed
US-20240287347-A1 RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-08-29 US disclosed
US-20240279432-A1 RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-08-22 US disclosed
US-20240174809-A1 RESIN COMPOSITION, RESIN SHEET, MULTILAYERED PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2024-05-30 US disclosed
EP-4357376-A1 RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-04-24 EP disclosed
EP-4074740-A1 RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-10-19 EP disclosed
US-11466123-B2 Resin composition, resin sheet, multilayer printed wiring board, and semiconductor device MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-10-11 US disclosed
WO-2022201621-A1 RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE 日本化薬株式会社 2022-09-29 WO disclosed
US-20220204695-A1 RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-06-30 US disclosed
EP-3916025-A1 RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-12-01 EP disclosed
WO-2021117762-A1 RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE 三菱瓦斯化学株式会社 2021-06-17 WO disclosed
EP-0659800-B1 Polyimide precursor composition, polyimide composition and process for the production of said polyimide composition CENTRAL GLASS CO LTD (JP) 1999-06-23 EP disclosed
US-5840369-A SCREEN PRINTING POLYIMIDE PRECURSOR INK ON SUBSTRATE, REMOVING SOLVENT, THERMALLY CURING INK TO FORM POLYIMIDE RELIEF PATTERN FILM CENTRAL GLASS CO., LTD. (JP) 1998-11-24 US disclosed
US-5686525-A THIXOTROPIC SCREEN PRINTING INK COMPRISING A HEAT TREATED POLYAMIC ACID SOLUTION OBTAINED BY REACTION OF AROMATIC TETRACARBOXYLIC ACID, DIAMINE AND A MALEIMIDE; RELIEF IMAGES CENTRAL GLASS COMPANY, LTD. (JP) 1997-11-11 US disclosed
EP-0659800-A1 Polyimide precursor composition, polyimide composition and process for the production of said polyimide composition CENTRAL GLASS COMPANY, LIMITED (JP) 1995-06-28 EP disclosed