SCHEMBL8406552

SCHEMBL8406552

CC(C)C(C)[Si](Cl)(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8404108 0.72
SCHEMBL9164862 0.72
SCHEMBL705202 0.67
SCHEMBL5034181 0.67 ALDH1A1 (0.31)
SCHEMBL7593959 0.67 ALDH1A1 (0.31)
SCHEMBL126333 0.64
SCHEMBL133587 0.64 ALDH1A1 (0.33)
SCHEMBL11775574 0.61
SCHEMBL11741937 0.61
SCHEMBL20815922 0.61 ALDH1A1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220213129-A1 SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) 2022-07-07 US disclosed
CN-113785085-A Silicon oxide film, material for gas barrier film, and method for producing silicon oxide film 东曹株式会社 2021-12-10 CN disclosed
WO-2020209202-A1 SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR MANUFACTURING SILICON OXIDE FILM 東ソー株式会社 2020-10-15 WO disclosed
EP-0957104-A2 Amine borane complexes and phosphine borane complexes as hydrosilation catalysts DOW CORNING CORPORATION (US) 1999-11-17 EP disclosed
US-5922895-A Amine borane complexes and phosphineborane complexes as catalyst for hydrosilation DOW CORNING CORPORATION (US) 1999-07-13 US disclosed