Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NQO1 | P15559 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.33 |
| ▸ | GRM5 | P41594 | 3/20 | 0.33 |
| ▸ | GAA | P10253 | 2/20 | 0.33 |
| ▸ | CHAT | P28329 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.32 |
| ▸ | NQO2 | P16083 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | DHFR | P00374 | 1/20 | 0.31 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.31 |
| ▸ | TUBB | P07437 | 1/20 | 0.31 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.31 |
| ▸ | TUBA1B | P68363 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14299203 | 0.83 | NQO1 (0.32) | NQO1ALDH1A1KDM4EGRM5GAA | |
| SCHEMBL9472950 | 0.81 | ALDH1A1 (0.38) | NQO1ALDH1A1KDM4EGRM5GAA | |
| SCHEMBL3440746 | 0.80 | NQO1 (0.42) | NQO1ALDH1A1KDM4EGRM5GAA | |
| SCHEMBL1639958 | 0.78 | GRM5 (0.32) | ALDH1A1KDM4EGRM5CYP1A2MEN1 | |
| SCHEMBL652937 | 0.77 | NQO1 (0.38) | NQO1ALDH1A1KDM4ECYP1A2CYP2A6 | |
| SCHEMBL27820573 | 0.77 | P2RY6 (0.34) | NQO1ALDH1A1KDM4EGRM5GAA | |
| SCHEMBL27814779 | 0.77 | ALDH1A1 (0.33) | NQO1ALDH1A1KDM4EGRM5GAA | |
| SCHEMBL28433044 | 0.76 | GRM5 (0.33) | NQO1ALDH1A1KDM4EGRM5GAA | |
| SCHEMBL497591 | 0.76 | GRM5 (0.33) | NQO1ALDH1A1KDM4EGRM5GAA | |
| SCHEMBL15756938 | 0.76 | P2RY6 (0.34) | NQO1ALDH1A1KDM4EGRM5GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-100432837-C | Thiophene-containing photoacid generators for use in photolithography | IBM (US) | 2008-11-12 | — | — | CN | claimed |
| CN-103376660-B | Containing the photo-corrosion-resisting agent composition for protecting hydroxyl and its pattern formation method is used for negative development | 国际商业机器公司 | 2017-12-05 | — | — | CN | disclosed |
| CN-103930828-B | Hydridization photo-corrosion-resisting agent composition and its pattern formation method of use | 国际商业机器公司 | 2016-10-12 | — | — | CN | disclosed |
| CN-103201680-B | Photoresist composition for negative development and pattern forming method using the same | 国际商业机器公司 | 2016-07-06 | — | — | CN | disclosed |
| CN-102741747-B | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | IBM | 2014-09-10 | — | — | CN | disclosed |
| CN-103930828-A | Hybrid photoresist composition and pattern forming method using thereof | IBM | 2014-07-16 | — | — | CN | disclosed |
| CN-103376660-A | Photoresist composition containing a protected hydroxyl group for negative development and pattern forming method using thereof | IBM | 2013-10-30 | — | — | CN | disclosed |
| CN-101910944-B | Ionic, organic photoacid generators for DUV, MUV and optical lithography based on peraceptor-substituted aromatic anions | IBM | 2013-08-07 | — | — | CN | disclosed |
| CN-103201680-A | Photoresist composition for negative development and pattern forming method using the same | IBM | 2013-07-10 | — | — | CN | disclosed |
| CN-102741747-A | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | IBM | 2012-10-17 | — | — | CN | disclosed |
| CN-101910944-A | Ionic, organic photoacid generators for DUV, MUV and optical lithography based on peraceptor-substituted aromatic anions | IBM | 2010-12-08 | — | — | CN | disclosed |
| CN-100432837-C | Thiophene-containing photoacid generators for use in photolithography | IBM (US) | 2008-11-12 | — | — | CN | disclosed |
| CN-1518684-A | Thiophene-containing photoacid generators for use in photolithography | �Ҵ���˾ | 2004-08-04 | — | — | CN | disclosed |
| EP-0939339-A1 | Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups | International Business Machines Corporation (US) | 1999-09-01 | — | — | EP | disclosed |