SCHEMBL8423740

SCHEMBL8423740

Cc1ccc(C(=O)Oc2ccccc2)cc1C

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 7/20 0.66
POLB P06746 1/20 0.66
KMT2A Q03164 5/20 0.60
CES2 O00748 1/20 0.58
CES1 P23141 1/20 0.58
MEN1 O00255 2/20 0.56
SMN1; SMN2 Q16637 2/20 0.56
KDM4E B2RXH2 1/20 0.56
NPC1 O15118 1/20 0.56
CYP1A2 P05177 1/20 0.56
CYP3A4 P08684 1/20 0.56
CYP2C9 P11712 1/20 0.56
CYP2C19 P33261 1/20 0.56
ALDH1A1 P00352 4/20 0.55
NSD2 O96028 1/20 0.54
TDP1 Q9NUW8 2/20 0.51
PARP10 Q53GL7 1/20 0.50
ALOX5 P09917 1/20 0.49
PRSS1 P07477 1/20 0.49
ACR P10323 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10001032 0.91 KMT2A (0.71) MAPTPOLBKMT2ACES2CES1
SCHEMBL20109915 0.89 MAPT (0.66) MAPTPOLBKMT2ACES2CES1
SCHEMBL4351853 0.88 MAPT (0.54) MAPTPOLBKMT2AMEN1SMN1; SMN2
SCHEMBL11584095 0.86 MAPT (0.53) MAPTPOLBKMT2AMEN1SMN1; SMN2
SCHEMBL22580745 0.86 MAPT (0.57) MAPTPOLBKMT2ACES2CES1
SCHEMBL21081614 0.86 KMT2A (0.65) MAPTPOLBKMT2ACES2CES1
SCHEMBL21241095 0.86 KMT2A (0.65) MAPTPOLBKMT2ACES2CES1
SCHEMBL12554041 0.86 KMT2A (0.65) MAPTPOLBKMT2AMEN1SMN1; SMN2
SCHEMBL13225828 0.86 KMT2A (0.65) MAPTPOLBKMT2ACES2CES1
SCHEMBL13527667 0.86 KMT2A (0.65) MAPTPOLBKMT2AMEN1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed
US-11692066-B2 Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 US disclosed
US-11692066-B2 Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 US disclosed
US-11676814-B2 Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-13 US disclosed
US-20210311395-A1 MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND FOR FORMING ORGANIC FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-07 US disclosed
US-20200332062-A1 MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND FOR FORMING ORGANIC FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-22 US disclosed
EP-0760359-B1 Method for preparing aromatic carbonate MITSUBISHI GAS CHEMICAL CO (JP) 1999-10-20 EP disclosed
US-5714627-A REACTING A DIALKYL CARBONATE WITH AN AROMATIC CARBOXYLIC ACID ARYL ESTER IN THE PRESENCE OF A CATALYST MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1998-02-03 US disclosed
EP-0760359-A1 Method for preparing aromatic carbonate MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1997-03-05 EP disclosed