SCHEMBL8425555

SCHEMBL8425555

O=[N+]([O-])c1ccc2[nH]cnc2c1.[Ag]

nearest known ligand 0.75

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.75
NAMPT P43490 1/20 0.75
XDH P47989 1/20 0.75
ALDH1A1 P00352 4/20 0.58
PARP1 P09874 1/20 0.58
MAPT P10636 6/20 0.46
POLB P06746 2/20 0.46
NOS1 P29475 2/20 0.46
MAOB P27338 1/20 0.46
TXNRD1 Q16881 1/20 0.46
TXNRD3 Q86VQ6 1/20 0.46
TXNRD2 Q9NNW7 1/20 0.46
GRIA1 P42261 1/20 0.46
GRIA2 P42262 1/20 0.46
GRIA3 P42263 1/20 0.46
GRIA4 P48058 1/20 0.46
TDP1 Q9NUW8 3/20 0.45
KDM4E B2RXH2 1/20 0.45
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL271340 0.98 CYP3A4 (0.77) CYP3A4NAMPTXDHALDH1A1PARP1
SCHEMBL29923659 0.98 CYP3A4 (0.77) CYP3A4NAMPTXDHALDH1A1PARP1
Silver SCHEMBL11230934 0.97 CYP3A4 (0.75) CYP3A4NAMPTXDHALDH1A1PARP1
Nitric Acid SCHEMBL4907401 0.93 CYP3A4 (0.71) CYP3A4NAMPTXDHALDH1A1PARP1
Dimethyl Sulfoxide SCHEMBL28289766 0.91 CYP3A4 (0.67) CYP3A4NAMPTXDHALDH1A1PARP1
Acetic Acid SCHEMBL28050837 0.89 CYP3A4 (0.65) CYP3A4NAMPTXDHALDH1A1PARP1
Alcohol SCHEMBL28252889 0.89 CYP3A4 (0.65) CYP3A4NAMPTXDHALDH1A1PARP1
Dimethylformamide SCHEMBL11127603 0.88 CYP3A4 (0.63) CYP3A4NAMPTXDHALDH1A1PARP1
SCHEMBL8425549 0.88 CYP3A4 (0.96) CYP3A4NAMPTXDHALDH1A1PARP1
SCHEMBL21223317 0.87 CYP3A4 (0.61) CYP3A4NAMPTXDHALDH1A1PARP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0573048-B1 A method of image formation KONISHIROKU PHOTO IND (JP) 1999-10-20 EP disclosed
EP-0190054-B2 Heat-processable color photosensitive material KONISHIROKU PHOTO IND (JP) 1994-01-12 EP disclosed
EP-0573048-A2 A method of image formation KONICA CORPORATION (JP) 1993-12-08 EP disclosed
EP-0190512-B1 POSITIVE IMAGE FORMING METHOD KONICA CORPORATION (JP) 1992-09-30 EP disclosed
EP-0256820-B1 THERMAL DEVELOPING LIGHT-SENSITIVE MATERIAL KONICA CORPORATION (JP) 1992-07-29 EP disclosed
US-5071740-A HEAT DEVELOPABLE COLOR PHOTOSENSITIVE MATERIAL KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1991-12-10 US disclosed
US-5032499-A High density, stability KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1991-07-16 US disclosed
US-4868089-A ANHYDROUS HEAT TREATMENT TO INCREASE SENSITIVITY OF SILVER HALIDE EMULSION KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1989-09-19 US disclosed
EP-0190054-B1 HEAT-PROCESSABLE COLOR PHOTOSENSITIVE MATERIAL KONICA CORPORATION (JP) 1989-04-19 EP disclosed
EP-0256820-A2 Thermal developing light-sensitive material KONICA CORPORATION (JP) 1988-02-24 EP disclosed
US-4213784-A Process for producing heat developable light-sensitive compositions and elements FUJI PHOTO FILM CO., LTD. (JP) 1980-07-22 US disclosed
US-4207112-A STORAGE STABILITY FUJI PHOTO FILM CO., LTD. (JP) 1980-06-10 US disclosed
US-4188212-A BEZNOTRIAZOLE FUJI PHOTO FILM CO., LTD. (JP) 1980-02-12 US disclosed
US-4106409-A Electrostatic printing method CANON KABUSHIKI KAISHA (JP) 1978-08-15 US disclosed
US-4102312-A Thermally developable light-sensitive materials TOYOTA JIDOSHA KOGYO KABUSHIKI KAISHA (JP) 1978-07-25 US disclosed
US-4057016-A Process for electrostatic printing and apparatus therefor CANON KABUSHIKI KAISHA (JA) 1977-11-08 US disclosed
US-4039334-A ORGANIC SILVER SALT AND HALIDE, REDUCING AGENT, ROSIN FUJI PHOTO FILM CO., LTD. (JA) 1977-08-02 US disclosed
US-4021249-A PHOTOGRAPHY FUJI PHOTO FILM CO., LTD. (JA) 1977-05-03 US disclosed
US-4009039-A Heat developable light-sensitive oxazoline containing element FUJI PHOTO FILM CO., LTD. (JA) 1977-02-22 US disclosed
US-4003749-A Heat-developable light-sensitive materials using the reaction product of a organic silver salt an a N-halo-oxazolidinone FUJI PHOTO FILM CO., LTD. (JA) 1977-01-18 US disclosed