SCHEMBL8433922

SCHEMBL8433922

CCCCCCOC(=O)c1ccc(C(C)N(C)C)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.61
NPC1 O15118 1/20 0.61
MAPT P10636 1/20 0.61
RAB9A P51151 1/20 0.61
LMNA P02545 5/20 0.54
TSHR P16473 3/20 0.54
CYP1A2 P05177 3/20 0.54
CYP2C19 P33261 2/20 0.54
ESR1 P03372 2/20 0.54
CYP2D6 P10635 2/20 0.54
MAPK1 P28482 1/20 0.54
NR1H2 P55055 1/20 0.54
RNASEL Q05823 1/20 0.54
SMN1; SMN2 Q16637 1/20 0.54
STS P08842 6/20 0.53
CYP3A4 P08684 2/20 0.52
CYP2C9 P11712 1/20 0.52
PDE4D Q08499 1/20 0.52
AKR1C4 P17516 1/20 0.50
AKR1C3 P42330 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5710123 0.85 ALDH1A1 (0.72) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL19762357 0.85 ALDH1A1 (0.72) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL197446 0.83 ALDH1A1 (0.83) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL108532 0.83 ALDH1A1 (0.83) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL10332378 0.83 ALDH1A1 (0.83) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL108412 0.83 ALDH1A1 (0.83) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL10591672 0.83 ALDH1A1 (0.83) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL9355782 0.83 ALDH1A1 (0.83) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL21048393 0.83 ALDH1A1 (0.83) ALDH1A1NPC1MAPTRAB9ALMNA
SCHEMBL2617118 0.83 ALDH1A1 (0.83) ALDH1A1NPC1MAPTRAB9ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10336976-B2 Photosensitive resin composition for forming cell culture substrate TOKYO OHKA KOGYO CO., LTD. (JP) 2019-07-02 US disclosed
US-20170137767-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING CELL CULTURE SUBSTRATE TOKYO OHKA KOGYO CO., LTD. (JP) 2017-05-18 US disclosed
EP-3133145-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING CELL CULTURE SUBSTRATE Tokyo Ohka Kogyo Co., Ltd. (JP) 2017-02-22 EP disclosed
US-5908720-A CARBON BLACK COATED WITH A RESIN OBTAINED FROM ONE OR MORE POLYMERIZABLE MONOMERS HAVING AT LEAST ONE REACTIVE GROUP SELECTED FROM THE GROUP CONSISTING OF EPOXY, THIOEPOXY, OXAZOLINE, AZILIDINE AND HYDROXYALKYL AMIDE GROUPS TOKYO OHKA KOGYO CO., LTD. (JP) 1999-06-01 US disclosed