SCHEMBL8434833

SCHEMBL8434833

Cc1ccc(S(=O)(=O)NN)cc1.O=C1c2ccccc2-c2ccccc21

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPRC P08575 2/20 0.57
LMNA P02545 2/20 0.56
MAPT P10636 2/20 0.56
ALDH1A1 P00352 2/20 0.56
CYP2C9 P11712 2/20 0.56
CYP2C19 P33261 2/20 0.56
L3MBTL1 Q9Y468 2/20 0.56
USP2 O75604 1/20 0.56
POLB P06746 1/20 0.56
NOD2 Q9HC29 1/20 0.56
PGAM1 P18669 1/20 0.51
CA2 P00918 3/20 0.50
CA12 O43570 3/20 0.50
CA9 Q16790 3/20 0.50
CA1 P00915 2/20 0.50
MCOLN3 Q8TDD5 1/20 0.50
NSD2 O96028 2/20 0.49
GAA P10253 2/20 0.48
SMN1; SMN2 Q16637 2/20 0.48
CDK2 P24941 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Toluene SCHEMBL1374569 0.85 CA9 (0.61) LMNAMAPTALDH1A1CYP2C9CYP2C19
SCHEMBL10778613 0.85 CA12 (0.61) LMNAMAPTALDH1A1CYP2C9CYP2C19
SCHEMBL250755 0.85 GAA (0.64) LMNAMAPTALDH1A1CYP2C9CYP2C19
SCHEMBL9091 0.85 GAA (0.64) LMNAMAPTALDH1A1CYP2C9CYP2C19
Hydrochloric Acid SCHEMBL4639536 0.83 SMN1; SMN2 (0.61) LMNAMAPTALDH1A1CYP2C9CYP2C19
Water SCHEMBL27947230 0.83 SMN1; SMN2 (0.61) LMNAMAPTALDH1A1CYP2C9CYP2C19
SCHEMBL28554322 0.83 SMN1; SMN2 (0.61) LMNAMAPTALDH1A1CYP2C9CYP2C19
Acetone SCHEMBL5923757 0.78 CA1 (0.59) LMNAMAPTALDH1A1POLBCA2
Benzaldehyde SCHEMBL28000926 0.77 CA12 (0.51) LMNAMAPTALDH1A1CYP2C9CYP2C19
Acetic Acid SCHEMBL27544357 0.77 CA1 (0.57) LMNAMAPTALDH1A1POLBCA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0704762-B1 Resist material and pattern formation WAKO PURE CHEM IND LTD (JP) 1999-12-15 EP disclosed
US-5558971-A HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1996-09-24 US disclosed
US-5558976-A HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1996-09-24 US disclosed
EP-0704762-A1 Resist material and pattern formation WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1996-04-03 EP disclosed