Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2110589 | 1.00 | LMNA (0.33) | LMNATHRBCA2 | |
| SCHEMBL2109493 | 1.00 | LMNA (0.33) | LMNATHRBCA2 | |
| SCHEMBL2109449 | 1.00 | LMNA (0.33) | LMNATHRBCA2 | |
| SCHEMBL2109729 | 1.00 | LMNA (0.33) | LMNATHRBCA2 | |
| SCHEMBL2111322 | 1.00 | LMNA (0.33) | LMNATHRBCA2 | |
| SCHEMBL843775 | 1.00 | LMNA (0.33) | LMNATHRBCA2 | |
| SCHEMBL2110523 | 1.00 | LMNA (0.33) | LMNATHRBCA2 | |
| SCHEMBL844221 | 0.97 | — | — | |
| SCHEMBL1767225 | 0.89 | — | — | |
| SCHEMBL843882 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 384 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12043749-B2 | Method for producing ink composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-23 | — | — | US | disclosed |
| EP-3496174-B1 | INK COMPOSITION AND PHOTOELECTRIC CONVERSION ELEMENT PRODUCED USING SAME | SUMITOMO CHEMICAL CO (JP) | 2024-06-12 | — | — | EP | disclosed |
| CN-118076663-A | Composition and ink composition | 住友化学株式会社 | 2024-05-24 | — | — | CN | disclosed |
| CN-111819700-B | Photoelectric conversion element | 住友化学株式会社 | 2024-04-30 | — | — | CN | disclosed |
| CN-114174374-B | Method for producing pi-conjugated polymer | 住友化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| WO-2024075537-A1 | REACTIVE COMPOUND, PRODUCTION METHOD FOR POLYMER COMPOUND, AND INTERMEDIATE | 住友化学株式会社 | 2024-04-11 | — | — | WO | disclosed |
| WO-2024075536-A1 | POLYMER, FILM, COMPOSITION, INK, ELECTRONIC ELEMENT, PHOTOELECTRIC CONVERSION ELEMENT, SOLAR CELL MODULE, AND IMAGE SENSOR | 住友化学株式会社 | 2024-04-11 | — | — | WO | disclosed |
| CN-114270556-B | Organic photoelectric conversion material | 住友化学株式会社 | 2024-03-29 | — | — | CN | disclosed |
| CN-117769897-A | Compound, composition, and photoelectric conversion element | 住友化学株式会社 | 2024-03-26 | — | — | CN | disclosed |
| US-11917839-B2 | High signal-to-noise ratio photoelectric conversion element | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20020058206-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-16 | — | — | US | disclosed |
| EP-1193556-A1 | Positive resist composition | Fuji Photo Film Co., Ltd. (JP) | 2002-04-03 | — | — | EP | disclosed |
| EP-1193555-A1 | Negative resist composition | Fuji Photo Film Co., Ltd. (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20020015916-A1 | POSITIVE RESIST COMPOSITION | FUJI PHOTO FILM CO., LTD. (JP) | 2002-02-07 | — | — | US | disclosed |
| US-20010036590-A1 | Chemical amplification type negative-working resist composition for electron beams or X-rays | FUJIFILM CORPORATION (JP) | 2001-11-01 | — | — | US | disclosed |
| US-6265135-B1 | ARYL SULFONIUM OR IODONIUM COMPOUND WHICH GENERATES BENZENE-, NAPHTHALENE- OR ANTHRACENESULFONIC ACID WHICH IS SUBSTITUTED BY AT LEAST ONE FLUORINE ATOM AND/OR AT LEAST ONE GROUP CONTAINING A FLUORINE ATOM. | FUJI PHOTO FILM CO., LTD. (JP) | 2001-07-24 | — | — | US | disclosed |
| EP-1117004-A2 | Electron beam or x-ray negative-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1117002-A1 | Negative-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-07-18 | — | — | EP | disclosed |
| EP-1109066-A1 | Chemical amplification type negative-working resist composition for electron beams or x-rays | FUJI PHOTO FILM CO., LTD. (JP) | 2001-06-20 | — | — | EP | disclosed |
| EP-1076261-A1 | Negative resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-02-14 | — | — | EP | disclosed |