⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9648184 | 0.94 | — | — | |
| SCHEMBL9648160 | 0.94 | — | — | |
| SCHEMBL9647151 | 0.94 | — | — | |
| SCHEMBL9647164 | 0.94 | — | — | |
| SCHEMBL16757300 | 0.92 | — | — | |
| SCHEMBL16757468 | 0.90 | — | — | |
| SCHEMBL9647290 | 0.90 | — | — | |
| SCHEMBL9647267 | 0.90 | — | — | |
| SCHEMBL905285 | 0.89 | CYP1A2 (0.35) | — | |
| SCHEMBL9648284 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2434342-B1 | Method for producing curable composition for imprints | FUJIFILM CORP (JP) | 2018-06-20 | — | — | EP | disclosed |
| EP-2556532-B1 | CURABLE COMPOSITION FOR IMPRINTS AND PRODUCING METHOD OF POLYMERIZABLE MONOMER FOR IMPRINTS | FUJIFILM CORP (JP) | 2017-12-20 | — | — | EP | disclosed |
| EP-2342243-B1 | COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD | FUJIFILM CORP (JP) | 2017-12-06 | — | — | EP | disclosed |
| US-9684233-B2 | Curable composition for imprints, patterning method and pattern | FUJIFILM CORPORATION (JP) | 2017-06-20 | — | — | US | disclosed |
| US-9663671-B2 | Curable composition for imprints and method of storing the same | FUJIFILM CORPORATION (JP) | 2017-05-30 | — | — | US | disclosed |
| US-9441065-B2 | Curable composition for imprints, cured product and method for manufacturing a cured product | FUJIFILM CORPORATION (JP) | 2016-09-13 | — | — | US | disclosed |
| US-9335628-B2 | Curable composition for imprints, patterning method and pattern | FUJIFILM CORPORATION (JP) | 2016-05-10 | — | — | US | disclosed |
| US-8999221-B2 | Curable composition for imprints, patterning method and pattern | FUJIFILM CORPORATION (JP) | 2015-04-07 | — | — | US | disclosed |
| US-8980404-B2 | Composition for imprints, pattern and patterning method | FUJIFILM CORPORATION (JP) | 2015-03-17 | — | — | US | disclosed |
| US-8933144-B2 | Curable composition for imprint, pattern-forming method and pattern | FUJIFILM CORPORATION (JP) | 2015-01-13 | — | — | US | disclosed |
| WO-2011040635-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2011-04-07 | — | — | WO | disclosed |
| US-20110059302-A1 | CURABLE COMPOSITION FOR IMPRINT, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2011-03-10 | — | — | US | disclosed |
| US-20110003909-A1 | (METH)ACRYLATE COMPOUND, CURABLE COMPOSITION USING THE SAME, CURABLE COMPOSITION FOR PHOTO-NANOIMPRINTS, CURED PRODUCT OF CURABLE COMPOSITION AND METHOD FOR MANUFACTURING CURED PRODUCT | FUJIFILM CORPORATION | 2011-01-06 | — | — | US | disclosed |
| EP-2244281-A1 | CURABLE COMPOSITION FOR NANOIMPRINT AND PATTERN-FORMING METHOD | FUJIFILM Corporation (JP) | 2010-10-27 | — | — | EP | disclosed |
| US-20100121013-A1 | CURABLE COMPOSITION FOR PHOTOIMPRINT, ITS CURED PRODUCT AND PRODUCTION METHOD FOR IT, AND COMPONENT OF LIQUID-CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2010-05-13 | — | — | US | disclosed |
| US-20100009138-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20100009287-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20100009137-A1 | COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20090283937-A1 | CURABLE COMPOSITION FOR NANOIMPRINT, AND PATTERNING METHOD | FUJIFILM CORPORATION (JP) | 2009-11-19 | — | — | US | disclosed |
| US-20090011367-A1 | INTERFACE BINDER, RESIST COMPOSITION CONTAINING THE SAME, LAMINATE FOR FORMING MAGNETIC RECORDING MEDIUM HAVING LAYER CONTAINING THE SAME, MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM USING THE SAME, AND MAGNETIC RECORDING MEDIUM PRODUCED BY THE MANUFACTURING METHOD | FUJIFILM CORPORATION (JP) | 2009-01-08 | — | — | US | disclosed |