Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CTSL | P07711 | 1/20 | 0.32 |
| ▸ | CTSB | P07858 | 1/20 | 0.32 |
| ▸ | CTSK | P43235 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL845094 | 0.89 | — | — | |
| SCHEMBL9647151 | 0.83 | — | — | |
| SCHEMBL9648184 | 0.83 | — | — | |
| SCHEMBL9647164 | 0.83 | — | — | |
| SCHEMBL9648160 | 0.83 | — | — | |
| SCHEMBL16757300 | 0.82 | — | — | |
| SCHEMBL9647267 | 0.80 | — | — | |
| SCHEMBL9647290 | 0.80 | — | — | |
| SCHEMBL16757468 | 0.80 | — | — | |
| SCHEMBL11291566 | 0.78 | CTSL (0.33) | CYP1A2CTSLCTSBCTSKLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101620376-B | Curing combination for stamping, condensate using the combination and method for producing the same, and members for liquid crystal display device | FUJI PHOTO FILM CO LTD | 2013-09-18 | — | — | CN | disclosed |
| WO-2011126131-A1 | PATTERN FORMING METHOD AND PROCESS FOR PRODUCING PATTERN SUBSTRATES | FUJIFILM CORPORATION (JP) | 2011-10-13 | — | — | WO | disclosed |
| EP-2352768-A2 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM Corporation (JP) | 2011-08-10 | — | — | EP | disclosed |
| EP-2342243-A1 | COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD | FUJIFILM Corporation (JP) | 2011-07-13 | — | — | EP | disclosed |
| EP-2268680-A1 | CURABLE COMPOSITION FOR IMPRINT,PATTERNING METHOD AND PATTERN | FUJIFILM Corporation (JP) | 2011-01-05 | — | — | EP | disclosed |
| WO-2010104188-A1 | CURABLE COMPOSITION FOR IMPRINT,PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-09-16 | — | — | WO | disclosed |
| WO-2010064726-A2 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-06-10 | — | — | WO | disclosed |
| WO-2010050614-A1 | COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD | FUJIFILM CORPORATION (JP) | 2010-05-06 | — | — | WO | disclosed |
| CN-101620376-A | Curing combination for stamping, condensate using the combination and method for producing the same, and members for liquid crystal display device | FUJI PHOTO FILM CO LTD | 2010-01-06 | — | — | CN | disclosed |
| CN-101620377-A | Curing combination for nanometer stamping, condensate and method for producing the same, and members for liquid crystal display device | FUJI PHOTO FILM CO LTD | 2010-01-06 | — | — | CN | disclosed |