SCHEMBL8484086

SCHEMBL8484086

CC(=O)c1ccc(S)cc1.CC(=O)c1ccc(SC(Cl)Cl)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 3/20 0.50
LMNA P02545 3/20 0.50
L3MBTL1 Q9Y468 2/20 0.50
ALDH1A1 P00352 1/20 0.44
MAPT P10636 6/20 0.37
RAB9A P51151 5/20 0.37
KMT2A Q03164 2/20 0.37
SMN1; SMN2 Q16637 3/20 0.36
HSD17B1 P14061 1/20 0.36
HTT P42858 2/20 0.36
MAPK1 P28482 3/20 0.34
NOS3 P29474 1/20 0.34
NOS1 P29475 1/20 0.34
NPC1 O15118 4/20 0.34
POLB P06746 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
MEN1 O00255 1/20 0.34
NLRP1 Q9C000 1/20 0.34
STAT3 P40763 1/20 0.33
STAT1 P42224 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9018827 0.91 HPGD (0.59) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL8487536 0.84 HTT (0.47) ALDH1A1SMN1; SMN2HTTCYP2C9CYP2C19
SCHEMBL8487539 0.81 CYP2C9 (0.33) HTTCYP2C9CYP2C19HSD17B10
SCHEMBL8488661 0.81 IDO1 (0.39) CYP2C9CYP2C19HSD17B10
SCHEMBL12141690 0.80 HPGD (0.79) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL487360 0.79 MAPT (0.54) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL8488034 0.78 HPGD (0.57) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL6517451 0.77 MAPT (0.52) HPGDLMNAL3MBTL1ALDH1A1MAPT
SCHEMBL6511474 0.77 MAPT (0.52) HPGDLMNAL3MBTL1ALDH1A1MAPT
Methane SCHEMBL8806303 0.77 MAPT (0.52) HPGDLMNAL3MBTL1ALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5932731-A HYDROLYZING A HETEROAROMATIC HALOGENATED METHYL SULFIDE IN PRESENCE OF AN ACID SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 1999-08-03 US disclosed