⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2289778 | 0.83 | THRB (0.31) | — | |
| SCHEMBL2289001 | 0.77 | — | — | |
| SCHEMBL33661 | 0.76 | THRB (0.44) | — | |
| SCHEMBL7256040 | 0.76 | THRB (0.44) | — | |
| SCHEMBL289015 | 0.76 | THRB (0.44) | — | |
| SCHEMBL896096 | 0.75 | THRB (0.30) | — | |
| Methacrylic Acid SCHEMBL4830706 | 0.75 | THRB (0.49) | — | |
| SCHEMBL15348149 | 0.75 | THRB (0.58) | — | |
| SCHEMBL17107244 | 0.75 | — | — | |
| SCHEMBL8511576 | 0.74 | THRB (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12036808-B2 | Ink jet recording method using temporary curing radiation | SEIKO EPSON CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |
| EP-3470477-A1 | RADIATION-CURABLE INK JET INK COMPOSITION AND INK JET RECORDING METHOD | Seiko Epson Corporation (JP) | 2019-04-17 | — | — | EP | disclosed |
| US-9925801-B2 | Ink jet recording method, ultraviolet curable ink, and ink jet recording apparatus | SEIKO EPSON CORPORATION (JP) | 2018-03-27 | — | — | US | disclosed |
| US-9873808-B2 | Ultraviolet-curable ink jet ink composition | SEIKO EPSON CORPORATION (JP) | 2018-01-23 | — | — | US | disclosed |
| US-9827760-B2 | Ink jet recording method and ink jet recording apparatus | SEIKO EPSON CORPORATION (JP) | 2017-11-28 | — | — | US | disclosed |
| US-9796193-B2 | Ink jet recording method, ultraviolet curable ink and ink jet recording apparatus | SEIKO EPSON CORPORATION (JP) | 2017-10-24 | — | — | US | disclosed |
| US-9782982-B2 | Ink jet recording method, ultraviolet curable ink and ink jet recording apparatus | SEIKO EPSON CORPORATION (JP) | 2017-10-10 | — | — | US | disclosed |
| US-9469771-B2 | Ultraviolet ray-curable clear ink composition and recording method | SEIKO EPSON CORPORATION (JP) | 2016-10-18 | — | — | US | disclosed |
| US-20160152044-A1 | INK JET RECORDING METHOD, ULTRAVIOLET CURABLE INK AND INK JET RECORDING APPARATUS | SEIKO EPSON CORP (JP) | 2016-06-02 | — | — | US | disclosed |
| US-9346290-B2 | Image recording apparatus | SEIKO EPSON CORPORATION (JP) | 2016-05-24 | — | — | US | disclosed |
| US-20140292969-A1 | IMAGE RECORDING APPARATUS | SEIKO EPSON CORPORATION (JP) | 2014-10-02 | — | — | US | disclosed |
| US-8664291-B2 | Ultraviolet-curable ink jet ink composition | SEIKO EPSON CORPORATION (JP) | 2014-03-04 | — | — | US | disclosed |
| US-20130321520-A1 | INK JET INK COMPOSITION, INK ACCOMMODATION BODY AND INK JET RECORDING METHOD | SEIKO EPSON CORPORATION (JP) | 2013-12-05 | — | — | US | disclosed |
| US-20130286121-A1 | INK JET RECORDING METHOD AND INK JET RECORDING APPARATUS | SEIKO EPSON CORPORATION (JP) | 2013-10-31 | — | — | US | disclosed |
| US-8564142-B2 | Radiation curable ink jet ink composition and ink jet recording method | SEIKO EPSON CORPORATION (JP) | 2013-10-22 | — | — | US | disclosed |
| US-20130258015-A1 | ULTRAVIOLET RAY-CURABLE CLEAR INK COMPOSITION AND RECORDING METHOD | SEIKO EPSON CORPORATION (JP) | 2013-10-03 | — | — | US | disclosed |
| US-20130258018-A1 | INK JET RECORDING METHOD, ULTRAVIOLET CURABLE INK, AND INK JET RECORDING APPARATUS | SEIKO EPSON CORPORATION (JP) | 2013-10-03 | — | — | US | disclosed |
| US-20130141504-A1 | LIGHT-CURABLE INK COMPOSITION FOR INK JET RECORDING AND INK JET RECORDING METHOD USING THE SAME | SEIKO EPSON CORPORATION (JP) | 2013-06-06 | — | — | US | disclosed |
| US-20120172483-A1 | PROCESS FOR PRODUCTION OF CURED MOLDED ARTICLE, AND CURED MOLDED ARTICLE | NIPPON SHOKUBAI CO., LTD (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20120133059-A1 | RADIATION CURABLE INK JET COMPOSITION, RECORDED MATTER, AND INK JET RECORDING METHOD | SEIKO EPSON CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |