⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9766334 | 0.70 | — | — | |
| SCHEMBL10615161 | 0.70 | — | — | |
| SCHEMBL132266 | 0.67 | — | — | |
| SCHEMBL8415457 | 0.67 | — | — | |
| SCHEMBL48919 | 0.65 | — | — | |
| SCHEMBL6820 | 0.65 | — | — | |
| SCHEMBL8384915 | 0.63 | — | — | |
| SCHEMBL8385687 | 0.60 | — | — | |
| SCHEMBL23300848 | 0.60 | — | — | |
| SCHEMBL7905425 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3684778-B1 | INTEGRATED PROCESS FOR THE MANUFACTURE OF METHYLCHLOROHYDRIDOMONOSILANES | MOMENTIVE PERFORMANCE MAT INC (US) | 2023-08-02 | — | — | EP | claimed |
| US-11518773-B2 | Integrated process for the manufacture of methylchlorohydridomonosilanes | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2022-12-06 | — | — | US | claimed |
| CN-109755019-A | A kind of low temperature resistant capacitor plant oil base impregnating agent | 骆玲 | 2019-05-14 | — | — | CN | claimed |
| EP-3684778-B1 | INTEGRATED PROCESS FOR THE MANUFACTURE OF METHYLCHLOROHYDRIDOMONOSILANES | MOMENTIVE PERFORMANCE MAT INC (US) | 2023-08-02 | — | — | EP | disclosed |
| US-11518773-B2 | Integrated process for the manufacture of methylchlorohydridomonosilanes | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2022-12-06 | — | — | US | disclosed |
| CN-110167879-A | Fumed silica and method for producing same | 株式会社德山 | 2019-08-23 | — | — | CN | disclosed |
| CN-109755019-A | A kind of low temperature resistant capacitor plant oil base impregnating agent | 骆玲 | 2019-05-14 | — | — | CN | disclosed |
| CN-106061921-B | Method for solidifying the silicon carbide precursors fiber based on raw polysilazane | 通用电气公司 | 2019-03-19 | — | — | CN | disclosed |
| CN-105609406-B | The manufacturing method of semiconductor devices, substrate processing device, gas supply system | 株式会社日立国际电气 | 2018-09-28 | — | — | CN | disclosed |
| CN-105296963-B | The manufacturing method and substrate processing device of semiconductor devices | 株式会社日立国际电气 | 2018-06-12 | — | — | CN | disclosed |
| CN-107026077-A | Manufacture method, lining processor and the gas supply system of semiconductor devices | 株式会社日立国际电气 | 2017-08-08 | — | — | CN | disclosed |
| CN-104183480-B | Semiconductor device manufacturing method and substrate processing apparatus | 株式会社日立国际电气 | 2017-03-29 | — | — | CN | disclosed |
| US-5939577-A | REACTION OF ORGANOSILANE WITH ANHYDROUS COPPER CHLORIDE | SANDIA CORPORATION (US) | 1999-08-17 | — | — | US | disclosed |