SCHEMBL132266

SCHEMBL132266

C[SiH2][SiH](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8384915 0.71
SCHEMBL8385687 0.67
SCHEMBL8512980 0.67
SCHEMBL6544204 0.67
SCHEMBL8386950 0.64
SCHEMBL10597275 0.62
SCHEMBL15756672 0.59
SCHEMBL3953298 0.59
SCHEMBL8381936 0.59
SCHEMBL10615161 0.56

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 134 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5354340-A Preparation of copolymers SHELL OIL COMPANY (US) 1994-10-11 US claimed
US-5227043-A Lithium cell; crosslinked silicon-containing polymer and salt in sheet form HITACHI MAXELL, LTD. (JP) 1993-07-13 US claimed
EP-0224360-B1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) 1992-04-08 EP claimed
EP-0378123-A1 Ionic conductive polymer electrolyte and cell comprising the same Hitachi Maxell Ltd. (JP) 1990-07-18 EP claimed
EP-0175614-B1 MAGNETIC RECORDING MEDIUM AND MANUFACTURING METHOD THEREOF Shin-Etsu Chemical Co., Ltd. (JP) 1989-03-08 EP claimed
US-4601950-A PLATING, PLASMA POLYMERIZATION OF SILICON COMPOUND, FLUOROPOLYMER COATING SHIN-ETSU CHEMICAL CO., LTD. (JP) 1986-07-22 US claimed
EP-0175614-A2 Magnetic recording medium and manufacturing method thereof Shin-Etsu Chemical Co., Ltd. (JP) 1986-03-26 EP claimed
US-4289890-A Synthesis of chloromethyldisilanes GORDON ROY G 1981-09-15 US claimed
JP-6313268-A None JP disclosed
EP-3684778-B1 INTEGRATED PROCESS FOR THE MANUFACTURE OF METHYLCHLOROHYDRIDOMONOSILANES MOMENTIVE PERFORMANCE MAT INC (US) 2023-08-02 EP disclosed
US-11518773-B2 Integrated process for the manufacture of methylchlorohydridomonosilanes MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2022-12-06 US disclosed
CN-113620301-A Method and device for producing silicon monoxide 储晞 2021-11-09 CN disclosed
CN-108821292-B Method and device for producing silicon monoxide 储晞 2021-07-23 CN disclosed
EP-2408618-B1 METHOD OF MAKING A THIN FILM COATING AGC FLAT GLASS NA INC (US) 2020-05-06 EP disclosed
US-4601950-A PLATING, PLASMA POLYMERIZATION OF SILICON COMPOUND, FLUOROPOLYMER COATING SHIN-ETSU CHEMICAL CO., LTD. (JP) 1986-07-22 US disclosed
US-4588800-A Platinum-nitrogen complex catalysts MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1986-05-13 US disclosed
EP-0175614-A2 Magnetic recording medium and manufacturing method thereof Shin-Etsu Chemical Co., Ltd. (JP) 1986-03-26 EP disclosed
EP-0061241-B1 PLATINUM-, RHODIUM-, AND IRIDIUM-NITROGEN COMPLEX CATALYSTS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1985-11-06 EP disclosed
US-4511715-A Platinum-nitrogen complex catalysts MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1985-04-16 US disclosed
EP-0061241-A1 Platinum-, rhodium-, and iridium-nitrogen complex catalysts MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1982-09-29 EP disclosed