Formaldehyde

Formaldehyde

SCHEMBL8516632

C=O.CCCCCCCCCc1c2cccc1OOCC2

nearest known ligand 0.37

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Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CYP1A1 P04798 2/20 0.37
KCNH2 Q12809 2/20 0.34
GPR84 Q9NQS5 1/20 0.33
CXCR5 P32302 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.32
CYP2D6 P10635 2/20 0.32
DRD2 P14416 1/20 0.32
SLC6A2 P23975 1/20 0.32
HTR2A P28223 1/20 0.32
HTR2C P28335 1/20 0.32
SLC6A4 P31645 1/20 0.32
ALDH1A1 P00352 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP2C19 P33261 1/20 0.31
SLC2A1 P11166 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL287633 0.96 KCNH2 (0.37) CYP1A1KCNH2GPR84CXCR5CYP2D6
SCHEMBL289726 0.96 KCNH2 (0.37) CYP1A1KCNH2GPR84CXCR5CYP2D6
SCHEMBL28054371 0.96 KCNH2 (0.37) CYP1A1KCNH2GPR84CXCR5CYP2D6
SCHEMBL3262722 0.96 KCNH2 (0.37) CYP1A1KCNH2GPR84CXCR5CYP2D6
SCHEMBL498621 0.96 KCNH2 (0.37) CYP1A1KCNH2GPR84CXCR5CYP2D6
SCHEMBL27995364 0.96 KCNH2 (0.37) CYP1A1KCNH2GPR84CXCR5CYP2D6
SCHEMBL7934680 0.96 KCNH2 (0.37) CYP1A1KCNH2GPR84CXCR5CYP2D6
SCHEMBL1878428 0.96 KCNH2 (0.37) CYP1A1KCNH2GPR84CXCR5CYP2D6
SCHEMBL28054351 0.96 KCNH2 (0.37) CYP1A1KCNH2GPR84CXCR5CYP2D6
Acetic Acid SCHEMBL4544166 0.91 CXCR5 (0.38) CYP1A1KCNH2CXCR5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0362778-B1 Photosensitive composition MITSUBISHI CHEM CORP (JP) 1999-01-13 EP disclosed
US-5219700-A Excellent development latitude, light safety, visible-on-exposure characteristic and printing resistance MITSUBISHI KASEI CORPORATION (JP) 1993-06-15 US disclosed
EP-0362778-A2 Photosensitive composition Mitsubishi Chemical Corporation (JP) 1990-04-11 EP disclosed