SCHEMBL8519636

SCHEMBL8519636

O=C(OCCN(CCOC(=O)c1ccccc1)c1ccccc1)c1ccccc1

nearest known ligand 0.61

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.61
LMNA P02545 2/20 0.58
SMN1; SMN2 Q16637 3/20 0.56
MAPK1 P28482 1/20 0.50
HIF1A Q16665 1/20 0.50
SLC6A2 P23975 1/20 0.50
SLC6A3 Q01959 1/20 0.50
KMT2A Q03164 1/20 0.50
ALDH1A1 P00352 2/20 0.49
PHLPP2 Q6ZVD8 1/20 0.46
ESR1 P03372 1/20 0.46
ESR2 Q92731 1/20 0.46
KCNA3 P22001 1/20 0.46
TSHR P16473 1/20 0.46
F2 P00734 1/20 0.45
NPC1 O15118 1/20 0.45
RAB9A P51151 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11676375 0.92 LMNA (0.63) TDP1LMNASMN1; SMN2MAPK1HIF1A
SCHEMBL11675791 0.91 TDP1 (0.51) TDP1LMNASMN1; SMN2MAPK1HIF1A
SCHEMBL8975088 0.90 LMNA (0.60) TDP1LMNASMN1; SMN2MAPK1HIF1A
SCHEMBL11676197 0.89 LMNA (0.59) TDP1LMNASMN1; SMN2MAPK1SLC6A3
SCHEMBL11676179 0.89 SMN1; SMN2 (0.65) TDP1LMNASMN1; SMN2MAPK1HIF1A
SCHEMBL7512736 0.88 TDP1 (0.49) TDP1LMNASMN1; SMN2MAPK1HIF1A
SCHEMBL11422422 0.85 MAPT (0.50) TDP1LMNASMN1; SMN2MAPK1HIF1A
SCHEMBL11670743 0.85 LMNA (0.50) TDP1LMNASMN1; SMN2KMT2AALDH1A1
SCHEMBL502025 0.83 TDP1 (0.68) TDP1LMNASMN1; SMN2MAPK1HIF1A
SCHEMBL11576099 0.83 SMN1; SMN2 (0.61) TDP1LMNASMN1; SMN2MAPK1HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120225386-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-09-06 US disclosed
US-20120225386-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-09-06 US disclosed
EP-0671440-B1 Monoazo dyes DYSTAR TEXTILFARBEN GMBH & CO (DE) 1999-07-28 EP disclosed
US-5608042-A DYEING POLYESTER ULTRAMICRO FIBERS DYSTAR JAPAN LTD. (JP) 1997-03-04 US disclosed
US-5527888-A USED FOR DYEING ULTRAMICRO POLYESTER FIBERS DYSTAR JAPAN LTD. (JP) 1996-06-18 US disclosed
EP-0671440-A2 Monoazo dyes DyStar Japan Ltd. (JP) 1995-09-13 EP disclosed
US-4801696-A POLYESTER BLENDS, COLORFASTNESS MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) 1989-01-31 US disclosed
US-4051117-A Triazole-azo-phenyl cationic dyestuffs BAYER AKTIENGESELLSCHAFT (DT) 1977-09-27 US disclosed
US-3963715-A Substituted pyrazines E. I. DU PONT DE NEMOURS & COMPANY (US) 1976-06-15 US disclosed