⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16088390 | 0.85 | — | — | |
| SCHEMBL1462559 | 0.83 | — | — | |
| SCHEMBL7948159 | 0.78 | CA12 (0.53) | — | |
| SCHEMBL1462570 | 0.78 | — | — | |
| SCHEMBL200206 | 0.77 | — | — | |
| SCHEMBL8852783 | 0.77 | ALDH1A1 (0.38) | — | |
| SCHEMBL29952647 | 0.76 | — | — | |
| SCHEMBL3931699 | 0.76 | — | — | |
| SCHEMBL20442265 | 0.76 | — | — | |
| SCHEMBL2558731 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230268178-A1 | PROTECTIVE COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-08-24 | — | — | US | disclosed |
| EP-2457940-B1 | Fluorinated supramolecular polymers | SUPRAPOLIX BV (NL) | 2018-10-24 | — | — | EP | disclosed |
| US-8969510-B2 | Fluorinated supramolecular polymers | SUPRAPOLIX B.V. (NL) | 2015-03-03 | — | — | US | disclosed |
| US-20130065882-A1 | VLA-4 inhibitory drug | MACHINAGA NOBUO (JP) | 2013-03-14 | — | — | US | disclosed |
| US-20120157437-A1 | VLA-4 INHIBITORY DRUG | DAIICHI SANKYO COMPANY, LIMITED (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20120136120-A1 | FLUORINATED SUPRAMOLECULAR POLYMERS | SUPRAPOLIX B.V. | 2012-05-31 | — | — | US | disclosed |
| EP-2457940-A1 | Fluorinated supramolecular polymers | SupraPolix B.V. (NL) | 2012-05-30 | — | — | EP | disclosed |
| US-8129366-B2 | VLA-4 inhibitory drug | DAIICHI SANKYO COMPANY, LIMITED (JP) | 2012-03-06 | — | — | US | disclosed |
| EP-2332517-A1 | Hair treating agent | Kao Corporation (JP) | 2011-06-15 | — | — | EP | disclosed |
| US-7923197-B2 | Lithographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2011-04-12 | — | — | US | disclosed |
| US-20100221658-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20090246692-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR | FUJIFILM CORPORATION (JP) | 2009-10-01 | — | — | US | disclosed |
| US-20090233901-A1 | VLA-4 INHIBITORY DRUG | DAIICHI SANKYO COMPANY, LIMITED (JP) | 2009-09-17 | — | — | US | disclosed |