SCHEMBL8524635

SCHEMBL8524635

CC(C)(C)C(O)CC(O)C(F)(F)C(F)(F)C(F)(F)F.[SrH2]

nearest known ligand 0.37

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1076531 0.98 TSHR (0.39) TSHR
SCHEMBL8524207 0.96 TSHR (0.37) TSHR
SCHEMBL10631577 0.96 TSHR (0.37) TSHR
SCHEMBL8526070 0.96 TSHR (0.37) TSHR
SCHEMBL7172508 0.86 CETP (0.33)
SCHEMBL7212787 0.79 CETP (0.40)
SCHEMBL4746773 0.78 TSHR (0.56) TSHR
SCHEMBL10631587 0.78
SCHEMBL14006051 0.77 LMNA (0.33)
SCHEMBL12081199 0.75 TSHR (0.59) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0616649-B1 APPARATUS AND METHOD FOR DELIVERY OF INVOLATILE REAGENTS ADVANCED TECH MATERIALS (US) 1998-04-01 EP claimed
US-5919522-A VAPOR DEPOSITION ADVANCED TECHNOLOGY MATERIALS, INC. (US) 1999-07-06 US disclosed
WO-1998045499-A1 GROWTH OF BaSrTiO3 USING POLYAMINE-BASED PRECURSORS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 1998-10-15 WO disclosed
EP-0616649-B1 APPARATUS AND METHOD FOR DELIVERY OF INVOLATILE REAGENTS ADVANCED TECH MATERIALS (US) 1998-04-01 EP disclosed
US-5711816-A Source reagent liquid delivery apparatus, and chemical vapor deposition system comprising same ADVANCED TECHNOLGY MATERIALS, INC. (US) 1998-01-27 US disclosed
US-5536323-A Apparatus for flash vaporization delivery of reagents ADVANCED TECHNOLOGY MATERIALS, INC. (US) 1996-07-16 US disclosed
EP-0616649-A4 APPARATUS AND METHOD FOR DELIVERY OF INVOLATILE REAGENTS. ADVANCED TECH MATERIALS (US) 1996-02-28 EP disclosed
US-5453494-A Vapor deposition of metals form complexes ADVANCED TECHNOLOGY MATERIALS, INC. (US) 1995-09-26 US disclosed
EP-0616649-A1 APPARATUS AND METHOD FOR DELIVERY OF INVOLATILE REAGENTS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 1994-09-28 EP disclosed
US-5280012-A Vapor deposition of Group 2a organometallic complex ADVANCED TECHNOLOGY MATERIALS INC. (US) 1994-01-18 US disclosed
US-5225561-A Superconductors ADVANCED TECHNOLOGY MATERIALS, INC. (US) 1993-07-06 US disclosed
WO-1993012266-A1 APPARATUS AND METHOD FOR DELIVERY OF INVOLATILE REAGENTS ADVANCED TECHNOLOGY MATERIALS, INC. (US) 1993-06-24 WO disclosed
US-5204314-A Method for delivering an involatile reagent in vapor form to a CVD reactor ADVANCED TECHNOLOGY MATERIALS, INC. (US) 1993-04-20 US disclosed