Naphthalene

Naphthalene

SCHEMBL8526780

CCOCC.[NaH].c1ccc2ccccc2c1

nearest known ligand 0.47

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Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP2A6 P11509 4/20 0.47
ALOX12 P18054 1/20 0.47
CYP1A2 P05177 2/20 0.42
TDP1 Q9NUW8 3/20 0.38
MAPK1 P28482 2/20 0.38
KDM4E B2RXH2 2/20 0.38
ACHE P22303 1/20 0.37
ALDH1A1 P00352 2/20 0.36
TSHR P16473 1/20 0.36
LTA4H P09960 1/20 0.36
BCHE P06276 2/20 0.35
TLR8 Q9NR97 1/20 0.35
GAA P10253 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
TP53 P04637 1/20 0.35
NQO1 P15559 1/20 0.35
AGXT P21549 1/20 0.34
LMNA P02545 1/20 0.34
HPGD P15428 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Naphthalene SCHEMBL1829374 0.97 CYP2A6 (0.50) CYP2A6ALOX12CYP1A2TDP1MAPK1
Naphthalene SCHEMBL11180075 0.89 CYP2A6 (0.42) CYP2A6ALOX12CYP1A2TDP1MAPK1
Anthracene SCHEMBL10690178 0.86 CYP2A6 (0.46) CYP2A6CYP1A2TDP1MAPK1KDM4E
Ether SCHEMBL783808 0.83 CYP2A6 (0.44) CYP2A6CYP1A2TDP1MAPK1KDM4E
Phenanthrene SCHEMBL27863132 0.81 ALDH1A1 (0.60) CYP2A6CYP1A2TDP1KDM4EALDH1A1
Biphenyl SCHEMBL18140862 0.80 ALDH1A1 (0.50) MAPK1KDM4EALDH1A1LTA4HL3MBTL1
Phthalazine SCHEMBL2566182 0.79 CYP1A2 (0.37) CYP2A6CYP1A2TDP1KDM4EALDH1A1
Ether SCHEMBL11878612 0.79 ALDH1A1 (0.41) CYP1A2TDP1MAPK1KDM4EALDH1A1
Ether SCHEMBL11876095 0.79 PTPRC (0.39) CYP1A2TDP1MAPK1KDM4EALDH1A1
Ether SCHEMBL491471 0.79 PTPRC (0.39) CYP1A2TDP1MAPK1KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5874154-A FOR SUBSEQUENT PLATING OF METALS FROM AN ELECTROLESS PLATING BATH, IMPROVED ADHESION AND ETCHABILITY, FOR ELECTRONIC COMPONENTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1999-02-23 US disclosed
US-5800858-A CATALYZING WALLS OF A VIA IN HALOGENATED POLYMER FOR PLATING OF CONDUCTIVE METAL; ELECTRONIC PACKAGING INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1998-09-01 US disclosed
US-5730890-A Method for conditioning halogenated polymeric materials and structures fabricated therewith INTERNATIONL BUSINESS MACHINES CORPORATION (US) 1998-03-24 US disclosed
US-5709906-A DEPOSITING AND DOPING THE SURFACE OF THE POLYMER SUBSTRATE WITH A METAL SEED OR CATALYST BY REDUCING A METAL SALT USING A REDUCING AGENT AND APROTIC SOLVENT TO IMPROVE THE ADHESION OF AN OVERLYING CONDUCTIVE METAL LAYER INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1998-01-20 US disclosed
US-5374454-A Dehalogenation of halogenated polymer with a reducing agent, metallization with metal in positive oxidation state giving catalytic sites; photoresists; etching, doping, patterning INTERNATIONAL BUSINESS MACHINES INCORPORATED (US) 1994-12-20 US disclosed
EP-0477543-A2 Method for conditioning halogenated polymeric materials and structures fabricated therewith International Business Machines Corporation (US) 1992-04-01 EP disclosed