SCHEMBL8527623

SCHEMBL8527623

C=Cc1cc(OC(=O)OC(C)(C)C)cc(OC(=O)OC(C)(C)C)c1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.49
KDM1A O60341 1/20 0.37
LMNA P02545 2/20 0.37
KDM4E B2RXH2 1/20 0.37
MEN1 O00255 1/20 0.37
TTR P02766 1/20 0.37
TP53 P04637 1/20 0.37
CYP3A4 P08684 1/20 0.37
MAPT P10636 1/20 0.37
KMT2A Q03164 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
CA2 P00918 1/20 0.36
CYP19A1 P11511 1/20 0.34
CYP24A1 Q07973 1/20 0.32
HTR2C P28335 1/20 0.31
OGA O60502 1/20 0.31
HIF1A Q16665 1/20 0.30
EPAS1 Q99814 1/20 0.30
CYP2D6 P10635 2/20 0.30
BCHE P06276 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16952833 0.89 ELANE (0.43) ELANEKDM1ACA2
SCHEMBL4055058 0.85 ELANE (0.62) ELANEKDM1ALMNAKDM4EMEN1
SCHEMBL2472047 0.84 ELANE (0.47) ELANEKDM1ALMNAKDM4EMEN1
SCHEMBL21268335 0.83 ELANE (0.43) ELANEKDM1ACA2OGA
SCHEMBL220773 0.83 ELANE (0.62) ELANEKDM1ALMNAKDM4EMEN1
SCHEMBL5465860 0.80 ELANE (0.53) ELANEKDM1ACA2
SCHEMBL22991574 0.80 ELANE (0.39) ELANEKDM1ACA2
SCHEMBL22991575 0.79 ELANE (0.38) ELANE
SCHEMBL19049949 0.79 ELANE (0.38) ELANE
4-Vinylphenol SCHEMBL3329424 0.78 ELANE (0.55) ELANEKDM1ALMNAKDM4EMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20190276575-A1 METHOD FOR PRODUCING RESIN AND METHOD FOR PRODUCING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2019-09-12 US disclosed
EP-0568496-B1 Photoresist materials based on polystyrene OLIN MICROELECTRONIC CHEM INC (US) 1998-12-30 EP disclosed
US-5324804-A Photoresist material based on polystyrenes CIBA-GEIGY CORPORATION (US) 1994-06-28 US disclosed
EP-0568496-A2 Photoresist materials based on polystyrene OCG Microelectronic Materials Inc. (US) 1993-11-03 EP disclosed