SCHEMBL8530238

SCHEMBL8530238

O=S(=O)(c1ccc(O)c(S(=O)(=O)c2ccc(Cl)cc2)c1)c1ccc(O)c(S(=O)(=O)c2ccc(Cl)cc2)c1

nearest known ligand 0.77

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.77
ALDH1A1 P00352 5/20 0.59
CYP3A4 P08684 1/20 0.59
MAPK1 P28482 1/20 0.59
GAA P10253 5/20 0.51
GFER P55789 1/20 0.51
PKM P14618 1/20 0.50
MEN1 O00255 1/20 0.50
KMT2A Q03164 1/20 0.50
MAPT P10636 2/20 0.48
HPGD P15428 2/20 0.46
KDM4E B2RXH2 1/20 0.46
ALOX15 P16050 1/20 0.46
HSD17B10 Q99714 1/20 0.46
CA12 O43570 1/20 0.45
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
CA3 P07451 1/20 0.45
CA4 P22748 1/20 0.45
CA6 P23280 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8431114 1.00 POLB (0.77) POLBALDH1A1CYP3A4MAPK1GAA
SCHEMBL8530017 0.95 POLB (0.81) POLBALDH1A1CYP3A4MAPK1GAA
SCHEMBL8046971 0.93 POLB (0.69) POLBALDH1A1CYP3A4MAPK1GAA
SCHEMBL8529006 0.93 POLB (0.69) POLBALDH1A1CYP3A4MAPK1GAA
SCHEMBL9646400 0.85 ALDH1A1 (0.64) POLBALDH1A1CYP3A4MAPK1GAA
SCHEMBL7126365 0.85 POLB (0.66) POLBALDH1A1GAAGFERPKM
SCHEMBL10970805 0.84 POLB (0.71) POLBALDH1A1CYP3A4MAPK1GAA
SCHEMBL1581191 0.84 POLB (0.81) POLBALDH1A1CYP3A4MAPK1GAA
SCHEMBL660467 0.83 GAA (0.73) POLBALDH1A1GAAGFERPKM
SCHEMBL6534882 0.83 GAA (0.73) POLBALDH1A1GAAGFERPKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0706997-B1 Sulfonyl compound and thermal-sensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1998-03-11 EP disclosed
US-5705452-A AS DEVELOPER; HIGH SENSITIVITY, LOW BACKGROUND BLUSH DURING STORAGE, RESISTANCE TO HEAT, MOISTURE, PLASTICIZER SANKO HAIHATSU KAGAKU KENKYUSHO (JP) 1998-01-06 US disclosed
EP-0706997-A1 Sulfonyl compound and thermal-sensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1996-04-17 EP disclosed