SCHEMBL853677

SCHEMBL853677

CCC(C)(C)CCC(=O)OC(C)(CC)CC(=O)OCC(F)(F)F

nearest known ligand 0.32

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.32
MLYCD O95822 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13262709 0.90 HTT (0.33) HTTMLYCD
SCHEMBL13262518 0.89 MLYCD (0.31) MLYCD
SCHEMBL13262533 0.87 HTT (0.33) HTT
SCHEMBL13262538 0.86 HTT (0.32) HTT
SCHEMBL13527639 0.85 HTT (0.39) HTT
SCHEMBL824345 0.79 HTT (0.35) HTT
SCHEMBL13262735 0.79
SCHEMBL13262711 0.78
SCHEMBL824298 0.77 HTT (0.37) HTT
SCHEMBL13262406 0.75 HTT (0.37) HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142979-B2 Resist composition for immersion exposure and method of forming resist pattern using the same Tokyo Ohka Tokyo Co., Ltd. (JP) 2012-03-27 US disclosed
US-20090311627-A1 Resist composition for immersion exposure and method of forming resist pattern using the same TOKYO OHKA KOGYO CO., LTD. 2009-12-17 US disclosed