Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | USP2 | O75604 | 1/20 | 0.44 |
| ▸ | LPAR1 | Q92633 | 7/20 | 0.44 |
| ▸ | LPAR3 | Q9UBY5 | 7/20 | 0.44 |
| ▸ | LPAR2 | Q9HBW0 | 4/20 | 0.44 |
| ▸ | HTT | P42858 | 2/20 | 0.43 |
| ▸ | PLA2G2C | Q5R387 | 2/20 | 0.40 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.40 |
| ▸ | PRKD3 | O94806 | 1/20 | 0.39 |
| ▸ | PRKCG | P05129 | 1/20 | 0.39 |
| ▸ | PRKCB | P05771 | 1/20 | 0.39 |
| ▸ | PRKCA | P17252 | 1/20 | 0.39 |
| ▸ | PRKCH | P24723 | 1/20 | 0.39 |
| ▸ | PRKCI | P41743 | 1/20 | 0.39 |
| ▸ | PRKCE | Q02156 | 1/20 | 0.39 |
| ▸ | PRKCQ | Q04759 | 1/20 | 0.39 |
| ▸ | PRKCZ | Q05513 | 1/20 | 0.39 |
| ▸ | PRKCD | Q05655 | 1/20 | 0.39 |
| ▸ | PRKD1 | Q15139 | 1/20 | 0.39 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.38 |
| ▸ | TLR2 | O60603 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15414996 | 0.94 | LPAR1 (0.38) | USP2LPAR1LPAR3LPAR2HTT | |
| SCHEMBL3322208 | 0.82 | HTT (0.39) | USP2LPAR1LPAR3LPAR2HTT | |
| SCHEMBL14958388 | 0.82 | USP2 (0.55) | USP2LPAR1LPAR3LPAR2HTT | |
| SCHEMBL2115602 | 0.81 | HSD17B10 (0.43) | USP2HTT | |
| SCHEMBL16496856 | 0.81 | DNM1 (0.42) | LPAR1LPAR3LPAR2DNM1 | |
| SCHEMBL5746522 | 0.81 | HTT (0.42) | USP2LPAR1LPAR3LPAR2HTT | |
| SCHEMBL9502490 | 0.81 | TSHR (0.42) | USP2LPAR1LPAR3LPAR2HTT | |
| SCHEMBL28458040 | 0.80 | USP2 (0.48) | USP2LPAR1LPAR3LPAR2HTT | |
| SCHEMBL28729471 | 0.80 | USP2 (0.44) | USP2LPAR1LPAR3LPAR2HTT | |
| SCHEMBL11695842 | 0.79 | LPAR6 (0.33) | LPAR1LPAR3LPAR2DNM1LPAR5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11912889-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20230257503-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-08-17 | — | — | US | disclosed |
| EP-4212256-A1 | RESIN COMPOSITION, CURED PRODUCT AND MANUFACTURING METHOD THEREFOR, AND LAMINATE | Mitsubishi Chemical Corporation (JP) | 2023-07-19 | — | — | EP | disclosed |
| CN-116075368-A | Resin composition, cured product, method for producing same, and laminate | 三菱化学株式会社 | 2023-05-05 | — | — | CN | disclosed |
| US-11542397-B2 | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-03 | — | — | US | disclosed |
| US-11413682-B2 | Method for producing surface-modified metal oxide fine particle, method for producing improved metal oxide fine particles, surface-modified metal oxide fine particles, and metal oxide fine particle dispersion liquid | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-08-16 | — | — | US | disclosed |
| US-20220220338-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-14 | — | — | US | disclosed |
| US-20220213348-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-07 | — | — | US | disclosed |
| US-11377522-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica-based coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-05 | — | — | US | disclosed |
| EP-3971229-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-03-23 | — | — | EP | disclosed |
| EP-2471841-A1 | ORGANIC SILICONE PARTICLES, METHOD OF PRODUCING ORGANIC SILICONE PARTICLES, AND COSMETIC, RESIN COMPOSITION AND COATING COMPOSITION CONTAINING ORGANIC SILICONE PARTICLES | Takemoto Yushi Kabushiki Kaisha (JP) | 2012-07-04 | — | — | EP | disclosed |
| EP-2472655-A1 | Negative electrode base member | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2012-07-04 | — | — | EP | disclosed |
| EP-2433979-A1 | IRREGULAR-SHAPED HOLLOW MICROPARTICLE, METHOD FOR PRODUCING SAME, AND COSMETIC MATERIAL AND RESIN COMPOSITION CONTAINING IRREGULAR-SHAPED HOLLOW MICROPARTICLE | Takemoto Yushi Kabushiki Kaisha (JP) | 2012-03-28 | — | — | EP | disclosed |
| US-20110224308-A1 | ORGANOSILICONE FINE PARTICLES, METHOD OF PRODUCTION THEREOF AND COSMETIC MATERIALS, RESIN COMPOSITIONS AND PAINT COMPOSITIONS CONTAINING SAME | TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) | 2011-09-15 | — | — | US | disclosed |
| US-20110171157-A1 | NON-SPHERICAL FINE PARTICLES, METHOD OF PRODUCTION THEREOF AND COSMETIC MATERIALS AND RESIN COMPOSITIONS CONTAINING SAME | ARATANI SATOSHI | 2011-07-14 | — | — | US | disclosed |
| US-20110142893-A1 | ORGANOSILICONE FINE PARTICLES, METHOD OF PRODUCING SAME, AND COSMETICS, RESIN COMPOSITIONS AND DEVELOPMENT TONERS CONTAINING SAME | TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20110129672-A1 | NON-SPHERICAL HOLLOW FINE PARTICLES, METHOD OF PRODUCTION THEREOF AND COSMETIC MATERIALS AND RESIN COMPOSITIONS CONTAINING SAME | ARATANI SATOSHI | 2011-06-02 | — | — | US | disclosed |
| US-20100119939-A1 | NEGATIVE ELECTRODE BASE MEMBER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-05-13 | — | — | US | disclosed |
| EP-2131423-A1 | NEGATIVE ELECTRODE BASE MEMBER | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2009-12-09 | — | — | EP | disclosed |
| US-20080318165-A1 | Composition For Forming Antireflective Film And Wiring Forming Method Using Same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-12-25 | — | — | US | disclosed |