SCHEMBL8542207

SCHEMBL8542207

C=CC(=O)OCC(C)(C)S(=O)(=O)O

nearest known ligand 0.50

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.50
TP53 P04637 3/20 0.50
HIF1A Q16665 3/20 0.50
CYP3A4 P08684 2/20 0.50
MAPK1 P28482 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
TSHR P16473 7/20 0.42
THRB P10828 2/20 0.42
HPGD P15428 1/20 0.41
HSD17B10 Q99714 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2624988 0.81 ALDH1A1 (0.50) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL11704076 0.80 ALDH1A1 (0.46) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL17289478 0.79 GSTP1 (0.33) ALDH1A1
SCHEMBL11412038 0.79 ALDH1A1 (0.44) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL17289477 0.78 HTT (0.32)
SCHEMBL285659 0.77 ALDH1A1 (0.59) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL19660295 0.77 ALDH1A1 (0.59) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL39919 0.77 ALDH1A1 (0.59) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL262028 0.77 ALDH1A1 (0.59) ALDH1A1TP53HIF1ACYP3A4MAPK1
SCHEMBL3146174 0.75 ALDH1A1 (0.57) ALDH1A1TP53HIF1ACYP3A4MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230251575-A1 PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-08-10 US disclosed
EP-3349228-B1 ELECTROCONDUCTIVE-POLYMER SOLUTION, CAPACITOR, AND PROCESS FOR PRODUCING CAPACITOR SHINETSU POLYMER CO (JP) 2022-03-09 EP disclosed
US-10483011-B2 Conductive composition, conductive composition production method, anti-static resin composition and antistatic resin film SHIN-ETSU POLYMER CO., LTD. (JP) 2019-11-19 US disclosed
US-10377908-B2 Conductive polymer solution, capacitor, and method for producing the capacitor SHIN-ETSU POLYMER CO., LTD. (JP) 2019-08-13 US disclosed
EP-3231845-B1 ADDITION-CURABLE ANTISTATIC ORGANOPOLYSILOXANE COMPOSITION AND ANTISTATIC SILICONE FILM SHINETSU POLYMER CO (JP) 2019-07-10 EP disclosed
US-10179868-B2 Addition-curable antistatic organopolysiloxane composition and antistatic silicone film SHIN-ETSU POLYMER CO., LTD. (JP) 2019-01-15 US disclosed
US-20180334577-A1 CONDUCTIVE POLYMER SOLUTION, CAPACITOR, AND METHOD FOR PRODUCING THE CAPACITOR SHIN-ETSU POLYMER CO., LTD. (JP) 2018-11-22 US disclosed
US-20180244952-A1 ADDITION-CURABLE ANTISTATIC ORGANOPOLYSILOXANE COMPOSITION AND ANTISTATIC SILICONE FILM SHIN-ETSU POLYMER CO., LTD. (JP) 2018-08-30 US disclosed
EP-3349228-A1 ELECTROCONDUCTIVE-POLYMER SOLUTION, CAPACITOR, AND PROCESS FOR PRODUCING CAPACITOR Shin-Etsu Polymer Co., Ltd. (JP) 2018-07-18 EP disclosed
EP-3231845-A1 ADDITION-CURABLE ANTISTATIC ORGANOPOLYSILOXANE COMPOSITION AND ANTISTATIC SILICONE FILM Shin-Etsu Polymer Co. Ltd. (JP) 2017-10-18 EP disclosed
US-20150348670-A1 CURABLE ANTISTATIC ORGANOPOLYSILOXANE COMPOSITION AND ANTISTATIC SILICONE FILM SHIN-ETSU POLYMER CO., LTD. (JP) 2015-12-03 US disclosed
US-20150348671-A1 CONDUCTIVE COMPOSITION, CONDUCTIVE COMPOSITION PRODUCTION METHOD, ANTI-STATIC RESIN COMPOSITION AND ANTISTATIC RESIN FILM SHIN-ETSU POLYMER CO., LTD. (JP) 2015-12-03 US disclosed
US-5804354-A SULFONATED POLYANILINES FUJITSU LIMITED (JP) 1998-09-08 US disclosed
US-5776659-A COATING ON A RESIST FILM FORMING A PATTERN FUJITSU LIMITED (JP) 1998-07-07 US disclosed
US-4661557-A Preparation of stable aqueous polymer dispersions which contain an alkenyl-aromatic compound as copolymerized units BASF AKTIENGESELLSCHAFT (DE) 1987-04-28 US disclosed
US-4215027-A Aqueous thermosettable coating compositions comprising aqueous copolymer latex, amine neutralized copolymer and melamine-formaldehyde resin CANADIAN INDUSTRIES LIMITED (CA) 1980-07-29 US disclosed
US-3992333-A NITROGEN AND SULFUR CONTAINING COPOLYMER IS SELF-CROSSLINKING BINDER ROHM AND HAAS COMPANY (US) 1976-11-16 US disclosed
US-3950294-A AQUEOUS COATING COMPOSITIONS OF DISPERSIONS OF THERMOPLASTIC ADDITION POLYMERS WITH LOW MOLECULAR WEIGHT PLASTICIZERS CONNELLY WILLIAM 1976-04-13 US disclosed