SCHEMBL854885

SCHEMBL854885

Nc1ncncn1.[BiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4458 0.96
Hydrochloric Acid SCHEMBL8681532 0.93
Water SCHEMBL6705186 0.93
Hydrochloric Acid SCHEMBL360708 0.93
Water SCHEMBL4239659 0.93 HSP90AA1 (0.93)
Formaldehyde SCHEMBL3745731 0.87
Boric Acid SCHEMBL8843854 0.84 HSP90AA1 (0.77)
SCHEMBL578041 0.84 HSP90AA1 (0.77)
SCHEMBL8156139 0.82 HSP90AA1 (0.72)
Carbamic Acid SCHEMBL5171984 0.80 HSP90AA1 (0.68)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20040226741-A1 Package for electronic device, base substrate, electronic device and fabrication method thereof TAIYO YUDEN CO., LTD. (JP) 2004-11-18 US claimed
US-RE45419-E1 Surface acoustic wave device and method of fabricating the same TAIYO YUDEN CO., LTD. (JP) 2015-03-17 US disclosed
EP-1471635-B1 Surface acoustic wave device and method of fabricating the same TAIYO YUDEN KK (JP) 2012-03-28 EP disclosed
CN-100433551-C Surface acoustic wave device and its mfg. method FUJITSU MEDIA DEVICES LTD (JP) 2008-11-12 CN disclosed
US-7304417-B2 Package for electronic device, base substrate, electronic device and fabrication method thereof FUJITSU MEDIA DEVICES LIMITED (JP) 2007-12-04 US disclosed
US-7227429-B2 Surface acoustic wave device and method of fabricating the same FUJITSU MEDIA DEVICES LIMITED (JP) 2007-06-05 US disclosed
CN-1642004-A Surface acoustic wave device FUJITSU MEDIA DEVICES LTD (JP) 2005-07-20 CN disclosed
US-20040226741-A1 Package for electronic device, base substrate, electronic device and fabrication method thereof TAIYO YUDEN CO., LTD. (JP) 2004-11-18 US disclosed
EP-1471635-A2 Surface acoustic wave device and method of fabricating the same Fujitsu Media Devices Limited (JP) 2004-10-27 EP disclosed
US-20040207485-A1 Surface acoustic wave device and method of fabricating the same TAIYO YUDEN CO., LTD. (JP) 2004-10-21 US disclosed
CN-1534868-A Srface acoustic wave device and its mfg. method ��ʿͨý�岿Ʒ��ʽ���� 2004-10-06 CN disclosed
CN-1534869-A Surface acoustic wave device and its mfg. method ��ʿͨý�岿Ʒ��ʽ���� 2004-10-06 CN disclosed
US-20040189146-A1 Surface acoustic wave device and method of fabricating the same FUJITSU MEDIA DEVICES LIMITED 2004-09-30 US disclosed
CN-1531199-A Electronic component package, substrate, electronic components and manufacture thereof ��ʿͨý�岿Ʒ��ʽ���� 2004-09-22 CN disclosed