⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13829088 | 0.73 | — | — | |
| SCHEMBL952357 | 0.73 | — | — | |
| SCHEMBL952356 | 0.73 | — | — | |
| SCHEMBL9504327 | 0.73 | — | — | |
| SCHEMBL15546709 | 0.67 | — | — | |
| SCHEMBL4284258 | 0.67 | — | — | |
| SCHEMBL264893 | 0.67 | — | — | |
| SCHEMBL4284263 | 0.67 | — | — | |
| SCHEMBL136678 | 0.67 | — | — | |
| SCHEMBL4284261 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5827611-A | Multilayered thermoplastic article with special properties | HOECHST CELANESE CORP (US) | 1998-10-27 | — | — | US | disclosed |
| EP-0467935-B1 | TRANSPARENT THERMOPLASTIC MOULDING MATERIAL CONSISTING OF ESTERS OF 2,3-DIFLUORACRYLIC ACID | HOECHST AG (DE) | 1994-12-14 | — | — | EP | disclosed |
| EP-0606598-A2 | Shaped articles of graduated refractive index exhibiting low dispersion | HOECHST CELANESE CORPORATION (US) | 1994-07-20 | — | — | EP | disclosed |
| WO-1994015005-A1 | SHAPED ARTICLES OF GRADUATED REFRACTIVE INDEX | HOECHST CELANESE CORPORATION (US) | 1994-07-07 | — | — | WO | disclosed |
| US-5283303-A | Optionally deuterated; high glass transition temperature; used in manufacture of waveguides | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-02-01 | — | — | US | disclosed |
| US-5175790-A | Waveguides for long distance transmission, high temperature continuous use | HOECHST AKTIENGESELLSCHAFT (DE) | 1992-12-29 | — | — | US | disclosed |
| EP-0467935-A1 | TRANSPARENT THERMOPLASTIC MOULDING MATERIAL CONSISTING OF ESTERS OF 2,3-DIFLUORACRYLIC ACID. | HOECHST AG (DE) | 1992-01-29 | — | — | EP | disclosed |
| WO-1990012040-A1 | TRANSPARENT THERMOPLASTIC MOULDING MATERIAL CONSISTING OF ESTERS OF 2,3-DIFLUORACRYLIC ACID | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-10-18 | — | — | WO | disclosed |