⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6832256 | 0.92 | — | — | |
| SCHEMBL14589426 | 0.86 | — | — | |
| SCHEMBL1938845 | 0.80 | — | — | |
| SCHEMBL940371 | 0.75 | TSHR (0.33) | — | |
| SCHEMBL4360669 | 0.74 | TSHR (0.33) | — | |
| SCHEMBL4360667 | 0.73 | CA1 (0.34) | — | |
| SCHEMBL12577667 | 0.69 | CA1 (0.33) | — | |
| SCHEMBL15449278 | 0.69 | — | — | |
| SCHEMBL10458238 | 0.67 | TSHR (0.30) | — | |
| SCHEMBL34509 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9459533-B2 | Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist | DOW GLOBAL TECHNOLOGIES LLC (US) | 2016-10-04 | — | — | US | disclosed |
| US-9459533-B2 | Polymer composition, photoresist comprising the polymer composition, and coated article comprising the photoresist | DOW GLOBAL TECHNOLOGIES LLC (US) | 2016-10-04 | — | — | US | disclosed |
| US-8936900-B2 | Calixarene and photoresist composition comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-01-20 | — | — | US | disclosed |
| US-8936900-B2 | Calixarene and photoresist composition comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-01-20 | — | — | US | disclosed |
| US-8765356-B2 | Calixarene compound and photoresist composition comprising same | DOW GLOBAL TECHNOLOGIES LLC (US) | 2014-07-01 | — | — | US | disclosed |
| US-8765356-B2 | Calixarene compound and photoresist composition comprising same | DOW GLOBAL TECHNOLOGIES LLC (US) | 2014-07-01 | — | — | US | disclosed |
| US-8703383-B2 | Photosensitive copolymer and photoresist composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-04-22 | — | — | US | disclosed |
| US-8703383-B2 | Photosensitive copolymer and photoresist composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-04-22 | — | — | US | disclosed |
| US-20130078569-A1 | CALIXARENE AND PHOTORESIST COMPOSITION COMPRISING SAME | DOW GLOBAL TECHNOLOGIES LLC (US) | 2013-03-28 | — | — | US | disclosed |
| US-20130078569-A1 | CALIXARENE AND PHOTORESIST COMPOSITION COMPRISING SAME | DOW GLOBAL TECHNOLOGIES LLC (US) | 2013-03-28 | — | — | US | disclosed |
| US-20120129105-A1 | PHOTOSENSITIVE COPOLYMER AND PHOTORESIST COMPOSITION | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-05-24 | — | — | US | disclosed |
| US-20120129105-A1 | PHOTOSENSITIVE COPOLYMER AND PHOTORESIST COMPOSITION | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-05-24 | — | — | US | disclosed |
| EP-2455812-A2 | Photosensitive copolymer and photoresist composition | Rohm and Haas Electronic Materials LLC (US) | 2012-05-23 | — | — | EP | disclosed |